SCHEMBL16590902

SCHEMBL16590902

C=Cc1ccc(OCCOc2ccc(S(=O)(=O)NS(=O)(=O)C(F)(F)F)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.40
CHRNB4 P30926 1/20 0.40
CHRNA3 P32297 1/20 0.40
CHRNA7 P36544 1/20 0.40
CHRNA4 P43681 1/20 0.40
PTPRZ1 P23471 1/20 0.38
TDP1 Q9NUW8 1/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
ALDH1A1 P00352 3/20 0.36
CACNA1H O95180 1/20 0.36
CACNA1B Q00975 1/20 0.36
HTT P42858 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
MMP2 P08253 2/20 0.36
MMP13 P45452 2/20 0.36
MMP9 P14780 1/20 0.36
CA12 O43570 3/20 0.35
CA1 P00915 3/20 0.35
CA2 P00918 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14771733 0.87 TDP1 (0.47) TDP1ALDH1A1CA12CA1CA2
SCHEMBL28671677 0.86 TDP1 (0.46) TDP1ALDH1A1CA12CA1CA2
SCHEMBL28671646 0.86 TDP1 (0.46) TDP1ALDH1A1CA12CA1CA2
SCHEMBL16590904 0.81 TEAD1 (0.40) TDP1SMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL16590901 0.79 CHRNB2 (0.34) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL26163130 0.77 TDP1 (0.37) TDP1CA1CA2LMNA
SCHEMBL16850406 0.76 TDP1 (0.44) TDP1SMN1; SMN2ALDH1A1CA12CA1
SCHEMBL18387060 0.74 CA2 (0.50) ALDH1A1MMP2MMP13MMP9CA12
SCHEMBL16590875 0.74 TDP1 (0.70) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL25442926 0.74 THRB (0.40) SMN1; SMN2MMP2MMP13MMP9CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 US disclosed