⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16593738 | 0.88 | — | — | |
| SCHEMBL16593474 | 0.88 | — | — | |
| SCHEMBL1766338 | 0.65 | — | — | |
| SCHEMBL131822 | 0.61 | — | — | |
| SCHEMBL382690 | 0.61 | — | — | |
| SCHEMBL622611 | 0.61 | — | — | |
| SCHEMBL17414865 | 0.60 | — | — | |
| SCHEMBL4675178 | 0.59 | CYP19A1 (0.30) | — | |
| SCHEMBL382785 | 0.59 | ALDH1A1 (0.35) | — | |
| SCHEMBL8067054 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20180329298-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-11-15 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9703195-B2 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | JSR CORPORATION (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20160299432-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2016-10-13 | — | — | US | disclosed |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150093703-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |