SCHEMBL16638148

SCHEMBL16638148

CCC(C)(C)C(=O)NCCCCOC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)c2ccccc12

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 2/20 0.34
TSHR P16473 4/20 0.33
MAPK1 P28482 2/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
ALDH1A1 P00352 2/20 0.32
LMNA P02545 2/20 0.32
FABP4 P15090 6/20 0.32
FABP5 Q01469 6/20 0.32
KDM4E B2RXH2 2/20 0.32
KDM4A O75164 1/20 0.32
KDM4C Q9H3R0 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
SLC2A1 P11166 1/20 0.31
CNR1 P21554 2/20 0.31
CNR2 P34972 2/20 0.31
CYP2C9 P11712 1/20 0.31
DRD2 P14416 1/20 0.30
DRD4 P21917 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742215 0.85 SLC2A1 (0.32) TSHRMAPK1TP53CYP3A4ALDH1A1
SCHEMBL18499585 0.80 SCARB1 (0.32) SLC2A1
SCHEMBL12040222 0.79 HPGDS (0.36) RIPK1CYP3A4ALDH1A1FABP4FABP5
SCHEMBL16638144 0.78 TSHR (0.34) TSHRMAPK1TP53CYP3A4ALDH1A1
SCHEMBL12040153 0.74 POLB (0.41) RIPK1TP53ALDH1A1LMNAL3MBTL1
SCHEMBL2742204 0.73 TSHR (0.32) TSHRMAPK1TP53CYP3A4ALDH1A1
SCHEMBL15450682 0.73 CDC25B (0.40) FABP4FABP5L3MBTL1CYP2C9
SCHEMBL15945497 0.72 MEN1 (0.32) DRD2DRD4
SCHEMBL16775338 0.71 SLC2A1 (0.33) TSHRALDH1A1LMNAFABP4FABP5
SCHEMBL9963797 0.71 STS (0.49) RIPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed