Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 2/20 | 0.33 |
| ▸ | FABP4 | P15090 | 10/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.31 |
| ▸ | TSHR | P16473 | 3/20 | 0.31 |
| ▸ | LMNA | P02545 | 3/20 | 0.31 |
| ▸ | HTT | P42858 | 2/20 | 0.31 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | FABP5 | Q01469 | 6/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12040205 | 0.85 | FABP4 (0.31) | SLC2A1FABP4ALDH1A1TSHRLMNA | |
| SCHEMBL10204313 | 0.84 | FABP4 (0.31) | SLC2A1FABP4ALDH1A1LMNA | |
| SCHEMBL15945497 | 0.77 | MEN1 (0.32) | GAA | |
| SCHEMBL12040222 | 0.77 | HPGDS (0.36) | SLC2A1FABP4ALDH1A1FABP5 | |
| SCHEMBL12040153 | 0.74 | POLB (0.41) | ALDH1A1LMNAHTTGAAHPGD | |
| SCHEMBL12040236 | 0.73 | FABP4 (0.31) | FABP4 | |
| SCHEMBL10204340 | 0.73 | FABP4 (0.31) | FABP4 | |
| SCHEMBL10183033 | 0.72 | TSHR (0.33) | SLC2A1FABP4ALDH1A1TSHRLMNA | |
| SCHEMBL15450682 | 0.72 | CDC25B (0.40) | FABP4FABP5 | |
| SCHEMBL9966116 | 0.71 | SLC2A1 (0.34) | SLC2A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052590-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |