Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.34 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.34 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17409263 | 0.83 | L3MBTL1 (0.34) | L3MBTL1APOBEC3ACTDSP1APOBEC3GGAA | |
| SCHEMBL2742240 | 0.82 | LMNA (0.35) | L3MBTL1APOBEC3ACTDSP1APOBEC3GGAA | |
| SCHEMBL12399639 | 0.80 | ALDH1A1 (0.36) | L3MBTL1GAAALDH1A1MEN1KMT2A | |
| SCHEMBL18351193 | 0.77 | POLB (0.35) | L3MBTL1ALDH1A1ATM | |
| SCHEMBL10182634 | 0.75 | ATM (0.34) | L3MBTL1APOBEC3ACTDSP1APOBEC3GGAA | |
| SCHEMBL15908880 | 0.73 | MLNR (0.32) | — | |
| SCHEMBL17409173 | 0.73 | L3MBTL1 (0.32) | L3MBTL1MEN1KMT2AATM | |
| SCHEMBL18499601 | 0.72 | ALDH1A1 (0.35) | L3MBTL1ALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL12040257 | 0.72 | — | — | |
| SCHEMBL18499597 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9005870-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |