SCHEMBL16638659

SCHEMBL16638659

C=C(CC(=O)OCCS(=O)(=O)O)C(=O)OCOC1CCCCC1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13555204 0.93 NAAA (0.35) NAAA
SCHEMBL13554293 0.83 NAAA (0.35) NAAA
SCHEMBL13554304 0.81 NAAA (0.40) NAAA
SCHEMBL2723010 0.79
SCHEMBL13554268 0.75 EPHX1 (0.30)
SCHEMBL16638663 0.74 SCN9A (0.31)
SCHEMBL22615722 0.72 NAAA (0.38) NAAA
SCHEMBL22615502 0.72 NAAA (0.38) NAAA
SCHEMBL18775641 0.71 NPC1 (0.44) NAAA
SCHEMBL18775796 0.71 NPC1 (0.33) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed