SCHEMBL13554304

SCHEMBL13554304

C=C(CC(=O)OCCCC)C(=O)OCOC1CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 4/20 0.40
EPHX2 P34913 3/20 0.39
FAAH O00519 1/20 0.35
TSHR P16473 4/20 0.34
EPHX1 P07099 1/20 0.33
NPC1 O15118 1/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
NFKB1 P19838 1/20 0.33
RAB9A P51151 1/20 0.33
NFKB2 Q00653 1/20 0.33
KMT2A Q03164 1/20 0.33
RELA Q04206 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HPGD P15428 1/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13554293 0.92 NAAA (0.35) NAAAEPHX2EPHX1TP53SMN1; SMN2
SCHEMBL13555204 0.84 NAAA (0.35) NAAA
SCHEMBL6517105 0.84 NAAA (0.48) NAAAEPHX2FAAHTSHREPHX1
SCHEMBL16638659 0.81 NAAA (0.32) NAAA
SCHEMBL6524359 0.80 EPHX2 (0.39) NAAAEPHX2FAAHTSHRNPC1
SCHEMBL194857 0.79 TSHR (0.52) NAAAFAAHTSHREPHX1HPGD
SCHEMBL13554268 0.79 EPHX1 (0.30) EPHX1
SCHEMBL28132099 0.77 TSHR (0.50) NAAAFAAHTSHREPHX1HPGD
Hydrochloric Acid SCHEMBL10881989 0.77 TSHR (0.50) NAAAFAAHTSHREPHX1HPGD
SCHEMBL22615496 0.76 NAAA (0.49) NAAAEPHX2FAAHTSHREPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN ASIC1, FGFR1, FGF1 NAAA 1063/4885EPHX2 2072/4885FAAH 1260/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.