Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.35 |
| ▸ | NAAA | Q02083 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14982776 | 0.98 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL36342 | 0.98 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL5528985 | 0.92 | ALDH1A1 (0.47) | ALDH1A1TSHRTHRBEPHX1HTT | |
| SCHEMBL2735074 | 0.89 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL13289645 | 0.87 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRB | |
| SCHEMBL18876486 | 0.86 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB | |
| SCHEMBL27646066 | 0.84 | THRB (0.50) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL2735080 | 0.83 | THRB (0.41) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL317213 | 0.82 | THRB (0.49) | ALDH1A1TSHRTHRBEPHX1NAAA | |
| SCHEMBL2739881 | 0.80 | EPHX1 (0.37) | ALDH1A1TSHREPHX1NAAAHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161257-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-05-25 | — | — | US | disclosed |
| US-20230152697-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-05-18 | — | — | US | disclosed |
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130137049-A1 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-7919227-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040970-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-18 | — | — | US | disclosed |