SCHEMBL317213

SCHEMBL317213

C=C(C)C(=O)OCCOC1CCCCC1

nearest known ligand 0.49

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.49
TSHR P16473 3/20 0.43
ALDH1A1 P00352 2/20 0.42
EPHX1 P07099 2/20 0.40
NAAA Q02083 2/20 0.39
NPC1 O15118 1/20 0.38
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
HTT P42858 2/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CYP19A1 P11511 1/20 0.32
LNPEP Q9UIQ6 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27646066 0.98 THRB (0.50) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL28493290 0.95 THRB (0.50) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL3871346 0.91 THRB (0.58) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL11509591 0.86 THRB (0.49) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL36342 0.84 ALDH1A1 (0.43) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL28403729 0.84 ALDH1A1 (0.54) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL14982776 0.84 ALDH1A1 (0.43) THRBTSHRALDH1A1EPHX1NAAA
SCHEMBL13879037 0.84 THRB (0.53) THRBTSHRALDH1A1CA1CA2
SCHEMBL2735080 0.84 THRB (0.41) THRBTSHRALDH1A1EPHX1NAAA
Cyclopentane SCHEMBL2397167 0.83 THRB (0.65) THRBTSHRALDH1A1EPHX1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6617086-B2 Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-09-09 US claimed
US-20020123010-A1 Forming a pattern of a negative photoresist INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-09-05 US claimed
US-6251569-B1 ACRYLATED ESTER INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-06-26 US claimed
US-20230383035-A1 PROTEIN-POLYMER NANOASSEMBLIES AND INTRACELLULAR PROTEIN DELIVERY NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2023-11-30 US disclosed
EP-3254849-B1 LAMINATE AND ELECTROCONDUCTIVE ROLLER BRIDGESTONE CORP (JP) 2019-07-03 EP disclosed
EP-3254850-B1 LAMINATE AND ELECTROCONDUCTIVE ROLLER BRIDGESTONE CORP (JP) 2019-06-26 EP disclosed
US-20160220348-A1 REFRACTIVE-DIFFRACTIVE OPHTHALMIC DEVICE AND COMPOSITIONS USEFUL FOR PRODUCING SAME DAVE, Jagrat Natavar (IN) 2016-08-04 US disclosed
EP-2591026-B1 REFRACTIVE-DIFFRACTIVE OPHTHALMIC DEVICE AND COMPOSITIONS USEFUL FOR PRODUCING SAME DAVE JAGRAT NATAVAR (IN) 2016-05-04 EP disclosed
US-9310624-B2 Refractive-diffractive ophthalmic device and compositions useful for producing same Jagrat Natavar DAVE (IN) 2016-04-12 US disclosed
US-9223211-B2 Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2015-05-28 US disclosed
CN-1749856-A Curable jettable liquid for flexography AGFA GEVAERT (BE) 2006-03-22 CN disclosed
US-6617086-B2 Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-09-09 US disclosed
US-20020123010-A1 Forming a pattern of a negative photoresist INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-09-05 US disclosed
US-6271300-B1 RESIN LATEX FOR BINDERS, EMULSIFIERS IN WATER, VINYL POLYMER SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2001-08-07 US disclosed
US-6251569-B1 ACRYLATED ESTER INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-06-26 US disclosed
US-5994025-A MIXTURE OF POLYMER AND ACID GENERATOR NEC CORPORATION (JP) 1999-11-30 US disclosed
EP-0718379-B1 HEAT-REVERSIBLE THICKENABLE BINDER COMPOSITION SANYO CHEMICAL IND LTD (JP) 1999-10-20 EP disclosed
US-5814687-A MAGNETIC PARTICLES WITH POLYMERS JSR CORPORATION (JP) 1998-09-29 US disclosed
EP-0718379-A1 HEAT-REVERSIBLE THICKENABLE BINDER COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 1996-06-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES LCP1, ARCN1, RARA THRB 4337/4885TSHR 4566/4885ALDH1A1 81/4885
US-20230383035-A1 PROTEIN-POLYMER NANOASSEMBLIES AND INTRACELLULAR PROTEIN DELIVERY NUP205, PHLPP2, MSN THRB 3897/4885TSHR 3625/4885ALDH1A1 4734/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.