Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | BCHE | P06276 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | PTPRC | P08575 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | IDO1 | P14902 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28694044 | 0.98 | CYP2D6 (0.32) | CYP2D6CYP2C19ALDH1A1HSD17B10KDM4E | |
| SCHEMBL28993325 | 0.93 | CYP2D6 (0.30) | CYP2D6CYP2C19 | |
| SCHEMBL10672097 | 0.90 | KDM4E (0.34) | ALDH1A1HSD17B10KDM4EMEN1LMNA | |
| Nitrobenzene SCHEMBL28851666 | 0.83 | ALDH1A1 (0.44) | ALDH1A1HSD17B10KDM4EMEN1LMNA | |
| SCHEMBL29397612 | 0.78 | ALDH1A1 (0.31) | ALDH1A1HSD17B10MEN1LMNAPOLB | |
| SCHEMBL30098817 | 0.74 | GSTP1 (0.37) | ALDH1A1KDM4EPOLBMAPTCA1 | |
| SCHEMBL7214854 | 0.72 | ALDH1A1 (0.38) | CYP2D6CYP2C19ALDH1A1HSD17B10KDM4E | |
| SCHEMBL1879515 | 0.71 | IDO1 (0.36) | CYP2D6CYP2C19ALDH1A1HSD17B10KDM4E | |
| SCHEMBL4238710 | 0.68 | MEN1 (0.34) | CYP2C19ALDH1A1KDM4EMEN1LMNA | |
| SCHEMBL5094569 | 0.68 | MEN1 (0.34) | CYP2C19ALDH1A1KDM4EMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116655567-B | Method for synthesizing 2, 3-disubstituted benzofuran derivatives | 常州大学 | 2024-11-19 | — | — | CN | claimed |
| CN-116655567-A | Method for synthesizing 2, 3-disubstituted benzofuran derivatives | 常州大学 | 2023-08-29 | — | — | CN | claimed |
| CN-114805171-B | N-aryl indole compound and synthesis method thereof | 河南师范大学 | 2023-08-04 | — | — | CN | claimed |
| CN-115521310-A | Synthesis method of isoindole isoquinoline spironaphthone compound | 河南师范大学 | 2022-12-27 | — | — | CN | claimed |
| CN-115403591-A | Method for synthesizing naphthothienooxepinoisoquinolinone compound | 河南师范大学 | 2022-11-29 | — | — | CN | claimed |
| EP-0273026-A2 | Solvents for Photoresist compositions | SHIPLEY COMPANY INC. (US) | 1988-06-29 | — | — | EP | claimed |
| EP-0085761-B1 | A POSITIVE RESIST COMPOSITION | International Business Machines Corporation (US) | 1986-08-20 | — | — | EP | claimed |
| EP-0085761-A1 | A positive resist composition | International Business Machines Corporation (US) | 1983-08-17 | — | — | EP | claimed |
| US-4397937-A | Positive resist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1983-08-09 | — | — | US | claimed |
| CN-119751320-A | Diazonaphthoquinone type photosensitive compound and application thereof in photoresist preparation | 湖北三峡实验室 | 2025-04-04 | — | — | CN | disclosed |
| CN-119431421-A | Compound with axial chirality or boron chirality BODIPYs and preparation method and application thereof | 中国医学科学院药用植物研究所 | 2025-02-14 | — | — | CN | disclosed |
| CN-116655567-B | Method for synthesizing 2, 3-disubstituted benzofuran derivatives | 常州大学 | 2024-11-19 | — | — | CN | disclosed |
| CN-116655567-B | Method for synthesizing 2, 3-disubstituted benzofuran derivatives | 常州大学 | 2024-11-19 | — | — | CN | disclosed |
| CN-118786371-A | Identification medium and article | 日本瑞翁株式会社 | 2024-10-15 | — | — | CN | disclosed |
| US-4343885-A | PHOTORESISTS | DYNACHEM CORPORATION (US) | 1982-08-10 | — | — | US | disclosed |
| EP-0005380-B1 | PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER | Dynachem Corporation (US) | 1982-01-06 | — | — | EP | disclosed |
| EP-0005379-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING CARBONYLIC HALIDES AS ACTIVATORS | Dynachem Corporation (US) | 1981-12-23 | — | — | EP | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4152158-A | Electrochemically treated photo-lithographic plates | POLYCHROME CORPORATION (US) | 1979-05-01 | — | — | US | disclosed |