Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.47 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.46 |
| ▸ | ATM | Q13315 | 2/20 | 0.44 |
| ▸ | CDC25B | P30305 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | USP2 | O75604 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27514569 | 0.87 | ALDH1A1 (0.56) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL28375818 | 0.87 | ALDH1A1 (0.50) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL6321237 | 0.86 | ALDH1A1 (0.54) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL1666435 | 0.85 | ALDH1A1 (0.58) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL1666496 | 0.84 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL28279653 | 0.83 | ALDH1A1 (0.51) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL1666495 | 0.81 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL22721273 | 0.81 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL27688215 | 0.81 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM | |
| SCHEMBL30618783 | 0.80 | ALDH1A1 (0.56) | ALDH1A1CYP2C9CYP2C8AKR1C3ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-5171506-A | Melt spinning | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1992-12-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | ALDH1A1 1170/4885CYP2C9 3763/4885CYP2C8 4096/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.