SCHEMBL1666435

SCHEMBL1666435

O=C(c1ccccc1)c1ccc(-c2ccccc2)c(C(=O)c2ccccc2)c1C(=O)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
CYP2C9 P11712 2/20 0.50
CYP2C8 P10632 1/20 0.50
AKR1C3 P42330 1/20 0.48
CDC25B P30305 1/20 0.47
ATM Q13315 1/20 0.47
GAA P10253 2/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
KDM4E B2RXH2 1/20 0.46
USP2 O75604 1/20 0.46
KEAP1 Q14145 1/20 0.46
NFE2L2 Q16236 1/20 0.46
MAPT P10636 1/20 0.46
PDE4A P27815 1/20 0.45
ADORA1 P30542 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1666651 0.85 ALDH1A1 (0.65) ALDH1A1CYP2C9CYP2C8AKR1C3ATM
SCHEMBL6321237 0.85 ALDH1A1 (0.54) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL1666409 0.85 ALDH1A1 (0.54) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL301948 0.85 ALDH1A1 (0.58) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL27688215 0.84 ALDH1A1 (0.53) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL22721273 0.84 ALDH1A1 (0.53) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
Water SCHEMBL9731251 0.83 ALDH1A1 (0.56) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL1667165 0.83 ALDH1A1 (0.56) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL27489172 0.81 AKR1C3 (0.60) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B
SCHEMBL1666496 0.80 ALDH1A1 (0.53) ALDH1A1CYP2C9CYP2C8AKR1C3CDC25B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 EP disclosed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP disclosed
US-8802353-B2 Compound for resist and radiation-sensitive composition specification MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-08-12 US disclosed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP disclosed
US-8350096-B2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-08 US disclosed
US-20130004896-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION ECHIGO MASATOSHI (JP) 2013-01-03 US disclosed
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION ECHIGO MASATOSHI 2011-07-07 US disclosed
CN-101088046-B Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO 2011-05-25 CN disclosed
US-7919223-B2 Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-04-05 US disclosed
US-20080113294-A1 Compound for Resist and Radiation-Sensitive Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-05-15 US disclosed
CN-101088046-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-12-12 CN disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION XRCC6, XRCC5, KISS1R ALDH1A1 1170/4885CYP2C9 3763/4885CYP2C8 4096/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.