Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 4/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | MAOB | P27338 | 3/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | NT5E | P21589 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | NSD2 | O96028 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1669176 | 0.98 | KDM4E (0.46) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL1667139 | 0.98 | KDM4E (0.46) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL9759775 | 0.90 | KDM4E (0.55) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL975681 | 0.83 | NCEH1 (0.53) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL1667077 | 0.82 | KDM4E (0.44) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL3702460 | 0.81 | ALDH1A1 (0.45) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL27989265 | 0.81 | ALDH1A1 (0.46) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL1666574 | 0.81 | KDM4E (0.42) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL1666583 | 0.81 | KDM4E (0.42) | ALDH1A1KDM4EGAAHPGDMAPT | |
| SCHEMBL19923097 | 0.81 | KDM4E (0.47) | ALDH1A1KDM4EGAAHPGDMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109689826-A | Rapid curing optical adhesive | 3M创新有限公司 | 2019-04-26 | — | — | CN | disclosed |
| CN-107709497-A | UV curable epoxy/acrylate adhesive compositions | 3M创新有限公司 | 2018-02-16 | — | — | CN | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| CN-103382181-B | Multiaryl-substituted pyrimidine derivative, its preparation method, organic electroluminescent device, and organic electroluminescent display device | BOE TECHNOLOGY GROUP CO LTD | 2015-05-20 | — | — | CN | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| CN-102093883-B | organic electroluminescent material and its synthesis method and use | CHINESE ACAD TECH INST PHYSICS | 2014-01-08 | — | — | CN | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| CN-103382181-A | Multiaryl-substituted pyrimidine derivative, its preparation method, organic electroluminescent device, and organic electroluminescent display device | BOE TECHNOLOGY GROUP CO LTD | 2013-11-06 | — | — | CN | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| CN-101412907-A | Organic electroluminescent material and its synthesis method and use | CHINESE ACAD TECH INST PHYSICS (CN) | 2009-04-22 | — | — | CN | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-0403096-A2 | High speed photopolymerizable printing plate with initiator in a topcoat | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-12-19 | — | — | EP | disclosed |
| EP-0326249-A2 | Polymerizable compositions comprising Mannich bases and diaryliodonium photoinitiators. | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-02 | — | — | EP | disclosed |
| US-4791045-A | COATINGS; GRAPHIC ARTS; INCREASED PHOTOSENSITIVITY FOR ADDITION POLYMERIZATION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-13 | — | — | US | disclosed |
| EP-0043267-A1 | Method of separating aromatic and nonaromatic hydrocarbons in mixed hydrocarbon feeds | UNION CARBIDE CORPORATION (US) | 1982-01-06 | — | — | EP | disclosed |
| US-4108896-A | VIRICIDES | RICHARDSON-MERRELL INC. (US) | 1978-08-22 | — | — | US | disclosed |