Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | WDR5 | P61964 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 1/20 | 0.49 |
| ▸ | LDHA | P00338 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.44 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.44 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.43 |
| ▸ | NSD2 | O96028 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1666528 | 0.91 | ALDH1A1 (0.54) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL27716365 | 0.91 | ALDH1A1 (0.54) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL27723137 | 0.90 | ALDH1A1 (0.49) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL7174966 | 0.89 | WDR5 (0.56) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL425867 | 0.85 | ALDH1A1 (0.49) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL8880118 | 0.85 | ALDH1A1 (0.45) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL426582 | 0.84 | ABCG2 (0.54) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL30714893 | 0.84 | ABCG2 (0.54) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL2120339 | 0.84 | NCEH1 (0.56) | NCEH1ALDH1A1HPGDMAPTWDR5 | |
| SCHEMBL1666909 | 0.83 | ALDH1A1 (0.47) | NCEH1ALDH1A1HPGDMAPTWDR5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4036818-A | Method of preparing polymers of polyphenylene type | KORSHAK VASILY VLADIMIROVICH | 1977-07-19 | — | — | US | claimed |
| US-20230235115-A1 | ESTER COMPOUND AND RESIN COMPOSITION | AJINOMOTO CO., INC. (JP) | 2023-07-27 | — | — | US | disclosed |
| EP-2662727-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-08-14 | — | — | EP | disclosed |
| EP-1739485-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2016-08-31 | — | — | EP | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| CN-102093883-B | organic electroluminescent material and its synthesis method and use | CHINESE ACAD TECH INST PHYSICS | 2014-01-08 | — | — | CN | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| CN-102070442-B | Method for producing high-purity naphthalic acid | UNIV ZHEJIANG | 2013-07-03 | — | — | CN | disclosed |
| US-20050070624-A1 | Arylsulfinate salts in photoinitiator systems for polymerization reactions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-03-31 | — | — | US | disclosed |
| US-20050070622-A1 | Arylsulfinate salts in initiator systems for polymeric reactions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-03-31 | — | — | US | disclosed |
| US-20050070627-A1 | Dental compositions and methods with arylsulfinate salts | 3M INNOVATIVE PROPERTIES COMPANY | 2005-03-31 | — | — | US | disclosed |
| EP-0444132-B1 | METHOD FOR PURIFYING A CRUDE DIMETHYL NAPHTHALENE DICARBOXYLATE | AMOCO CORP (US) | 1996-05-29 | — | — | EP | disclosed |
| US-4933491-A | FROM LIQUID PHASE OXIDATION OF A DIALKYLNAPHTHALENE, REACTING WITH LOWER ALKANOIC ACID ANHYDRIDE, CRYSTALLIZATION | AMOCO CORPORATION (US) | 1990-06-12 | — | — | US | disclosed |
| US-4886901-A | Method for purifying a crude dimethyl naphthalene dicarboxylate | AMOCO CORPORATION (US) | 1989-12-12 | — | — | US | disclosed |
| EP-0326249-A2 | Polymerizable compositions comprising Mannich bases and diaryliodonium photoinitiators. | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-02 | — | — | EP | disclosed |
| US-4791045-A | COATINGS; GRAPHIC ARTS; INCREASED PHOTOSENSITIVITY FOR ADDITION POLYMERIZATION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-13 | — | — | US | disclosed |
| US-4036818-A | Method of preparing polymers of polyphenylene type | KORSHAK VASILY VLADIMIROVICH | 1977-07-19 | — | — | US | disclosed |
| US-4036818-A | Method of preparing polymers of polyphenylene type | KORSHAK VASILY VLADIMIROVICH | 1977-07-19 | — | — | US | disclosed |