Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | BCHE | P06276 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | THPO | P40225 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4453723 | 0.76 | CYP3A4 (0.51) | MEN1KMT2ABCHEACHEALDH1A1 | |
| SCHEMBL13402025 | 0.73 | CHRM2 (0.46) | MEN1KMT2AALDH1A1MAPTLMNA | |
| SCHEMBL18243551 | 0.72 | KMT2A (0.42) | MEN1KMT2AALDH1A1MAPTPOLB | |
| SCHEMBL12143763 | 0.71 | ALDH1A1 (0.50) | MEN1KMT2ABCHEACHEALDH1A1 | |
| SCHEMBL8481321 | 0.70 | CHRM2 (0.50) | MEN1KMT2AACHEALDH1A1MAPT | |
| SCHEMBL12143762 | 0.70 | ALDH1A1 (0.53) | MEN1KMT2AALDH1A1CYP3A4CYP2C9 | |
| SCHEMBL24590166 | 0.68 | ALDH1A1 (0.47) | MEN1KMT2ABCHEACHEALDH1A1 | |
| SCHEMBL10615538 | 0.68 | GAA (0.45) | MEN1KMT2ABCHEACHEALDH1A1 | |
| Chloromethane SCHEMBL10447535 | 0.68 | HSD11B1 (0.60) | MEN1KMT2AALDH1A1GAAKDM4E | |
| SCHEMBL23862419 | 0.68 | ALDH1A1 (0.37) | MEN1KMT2ABCHEACHEALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-20240210831-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-4386037-A1 | SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-19 | — | — | EP | disclosed |
| US-20240184206-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| CN-118103774-A | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming method | 信越化学工业株式会社 | 2024-05-28 | — | — | CN | disclosed |
| WO-2024101182-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERN FORMING METHOD, AND LIGHT-EMITTING ELEMENT | 信越化学工業株式会社 | 2024-05-16 | — | — | WO | disclosed |
| EP-4365679-A1 | LAYERED BODY, METHOD FOR MANUFACTURING LAYERED BODY, AND METHOD FOR FORMING PATTERN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-08 | — | — | EP | disclosed |
| WO-2024075585-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MEMBRANE, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD, AND LIGHT-EMITTING ELEMENT | 信越化学工業株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2024075581-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, PATTERN FORMING METHOD, AND LIGHT-EMITTING ELEMENT | 信越化学工業株式会社 | 2024-04-11 | — | — | WO | disclosed |
| EP-3656803-B1 | POLYSILOXANE SKELETON POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND FABRICATION OF OPTO-SEMICONDUCTOR DEVICE | SHINETSU CHEMICAL CO (JP) | 2024-04-10 | — | — | EP | disclosed |
| EP-2364847-B1 | PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2015-07-22 | — | — | EP | disclosed |
| US-8729148-B2 | Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8048611-B2 | Polyorganosiloxane, resin composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| EP-2364847-A1 | Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-09-14 | — | — | EP | disclosed |
| US-20110143092-A1 | PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-2112188-B1 | Polyorganosiloxane, resin composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-04-27 | — | — | EP | disclosed |
| US-7785766-B2 | Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-31 | — | — | US | disclosed |
| US-20090269697-A1 | POLYORGANOSILOXANE, RESIN COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2112188-A1 | Polyorganosiloxane, resin composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| US-20080182087-A1 | SILPHENYLENE-BEARING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE CIRCUIT PROTECTIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-07-31 | — | — | US | disclosed |