Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16139521 | 0.86 | ALDH1A1 (0.34) | ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL16683065 | 0.85 | ALDH1A1 (0.36) | ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL17147954 | 0.84 | ALDH1A1 (0.35) | ALDH1A1KMT2ASMN1; SMN2HPGD | |
| SCHEMBL16591083 | 0.83 | ALDH1A1 (0.35) | ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL17175337 | 0.81 | ALDH1A1 (0.38) | ALDH1A1KMT2AHPGD | |
| SCHEMBL16683097 | 0.80 | ALDH1A1 (0.37) | ALDH1A1KMT2AHPGD | |
| SCHEMBL2607811 | 0.79 | ALDH1A1 (0.41) | ALDH1A1KMT2ASMN1; SMN2HPGD | |
| SCHEMBL16081315 | 0.79 | ALDH1A1 (0.36) | ALDH1A1KMT2A | |
| SCHEMBL16139526 | 0.78 | ALDH1A1 (0.38) | ALDH1A1KMT2A | |
| SCHEMBL17175355 | 0.77 | ALDH1A1 (0.40) | ALDH1A1KMT2ASMN1; SMN2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |