Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.33 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | MITF | O75030 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16081314 | 0.87 | ALDH1A1 (0.40) | ALDH1A1KMT2AFFAR1SLC7A5TSHR | |
| SCHEMBL16683047 | 0.86 | KMT2A (0.41) | ALDH1A1KMT2AFFAR1SLC7A5TSHR | |
| SCHEMBL16683097 | 0.85 | ALDH1A1 (0.37) | ALDH1A1KMT2ASLC7A5KDM4ETSHR | |
| SCHEMBL17175323 | 0.84 | FFAR1 (0.40) | ALDH1A1KMT2AFFAR1SLC7A5TSHR | |
| SCHEMBL16081316 | 0.84 | ALDH1A1 (0.39) | ALDH1A1KMT2AFFAR1SLC7A5KDM4E | |
| SCHEMBL2607811 | 0.84 | ALDH1A1 (0.41) | ALDH1A1KMT2ASLC7A5KDM4ETSHR | |
| SCHEMBL17175355 | 0.82 | ALDH1A1 (0.40) | ALDH1A1KMT2ASLC7A5KDM4ETSHR | |
| SCHEMBL16591140 | 0.82 | ALDH1A1 (0.40) | ALDH1A1KMT2AFFAR1SLC7A5TSHR | |
| SCHEMBL16683069 | 0.81 | ALDH1A1 (0.34) | ALDH1A1KMT2AHPGD | |
| SCHEMBL16081318 | 0.81 | ALDH1A1 (0.42) | ALDH1A1KMT2AFFAR1SLC7A5KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |