SCHEMBL16683097

SCHEMBL16683097

CCC(C)c1ccc(OC(CC(C(C)C)C(C)C)OCCOC2CCCCC2)cc1

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.37
KMT2A Q03164 3/20 0.34
HPGD P15428 1/20 0.32
SLC7A5 Q01650 1/20 0.32
KDM4E B2RXH2 1/20 0.32
TSHR P16473 1/20 0.32
MEN1 O00255 2/20 0.31
MITF O75030 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
NPSR1 Q6W5P4 1/20 0.30
GAA P10253 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15279311 0.88 HPGD (0.33) ALDH1A1KMT2AHPGDKDM4EMEN1
SCHEMBL16683054 0.85 ALDH1A1 (0.38) ALDH1A1KMT2AHPGDSLC7A5TSHR
SCHEMBL17175337 0.85 ALDH1A1 (0.38) ALDH1A1KMT2AHPGDSLC7A5KDM4E
SCHEMBL17175355 0.84 ALDH1A1 (0.40) ALDH1A1KMT2AHPGDSLC7A5KDM4E
SCHEMBL2607811 0.83 ALDH1A1 (0.41) ALDH1A1KMT2AHPGDSLC7A5KDM4E
SCHEMBL16683069 0.80 ALDH1A1 (0.34) ALDH1A1KMT2AHPGD
SCHEMBL16683050 0.78 ALDH1A1 (0.41) ALDH1A1KMT2AHPGDSLC7A5TSHR
SCHEMBL16683051 0.76 ALDH1A1 (0.39) ALDH1A1KMT2ASLC7A5TSHRMEN1
SCHEMBL2607702 0.76 ALDH1A1 (0.42) ALDH1A1KMT2ASLC7A5KDM4ETSHR
SCHEMBL17147954 0.75 ALDH1A1 (0.35) ALDH1A1KMT2AHPGDSLC7A5KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed