Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16683051 | 0.89 | ALDH1A1 (0.39) | SLC7A5SLC6A2SLC6A4SLC6A3ALDH1A1 | |
| SCHEMBL11922887 | 0.88 | SLC6A3 (0.41) | SLC7A5SLC6A2SLC6A4SLC6A3ALDH1A1 | |
| SCHEMBL10182645 | 0.87 | ALDH1A1 (0.41) | SLC7A5ALDH1A1NFE2L2KMT2ATSHR | |
| SCHEMBL16683054 | 0.87 | ALDH1A1 (0.38) | SLC7A5ALDH1A1NFE2L2KMT2ATSHR | |
| SCHEMBL14461798 | 0.86 | ALDH1A1 (0.40) | SLC7A5ALDH1A1NFE2L2TSHRFFAR1 | |
| SCHEMBL11999025 | 0.85 | SLC7A5 (0.43) | SLC7A5SLC6A2SLC6A4SLC6A3ALDH1A1 | |
| SCHEMBL16081314 | 0.85 | ALDH1A1 (0.40) | SLC7A5ALDH1A1NFE2L2KMT2ATSHR | |
| SCHEMBL17736517 | 0.83 | ALDH1A1 (0.41) | SLC7A5ALDH1A1NFE2L2KMT2ATSHR | |
| SCHEMBL18474086 | 0.82 | ALDH1A1 (0.38) | SLC7A5ALDH1A1NFE2L2KMT2AFFAR1 | |
| SCHEMBL14118912 | 0.81 | ALDH1A1 (0.37) | SLC7A5ALDH1A1NFE2L2KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |