SCHEMBL16683054

SCHEMBL16683054

CCC(C)c1ccc(OC(CC(C(C)C)C(C)C)OCCC2CCCCC2)cc1

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
NFE2L2 Q16236 1/20 0.36
KMT2A Q03164 3/20 0.35
FFAR1 O14842 1/20 0.33
SLC7A5 Q01650 1/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 2/20 0.31
MITF O75030 1/20 0.31
PPARG P37231 1/20 0.31
PPARD Q03181 1/20 0.31
PPARA Q07869 1/20 0.31
HPGD P15428 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
MAOB P27338 1/20 0.31
KLK7 P49862 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16683051 0.91 ALDH1A1 (0.39) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL10182645 0.89 ALDH1A1 (0.41) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL16081314 0.87 ALDH1A1 (0.40) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL16683100 0.87 SLC7A5 (0.41) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL16683097 0.85 ALDH1A1 (0.37) ALDH1A1KMT2ASLC7A5TSHRMEN1
SCHEMBL17736517 0.85 ALDH1A1 (0.41) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL18474086 0.84 ALDH1A1 (0.38) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL14462010 0.83 ALDH1A1 (0.40) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL14118912 0.83 ALDH1A1 (0.37) ALDH1A1NFE2L2KMT2AFFAR1SLC7A5
SCHEMBL11922887 0.83 SLC6A3 (0.41) ALDH1A1SLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed