SCHEMBL16683128

SCHEMBL16683128

CCC(C)c1ccc(Sc2c(F)c(F)c(S(=O)(=O)O)c(F)c2F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
CA7 P43166 2/20 0.41
CA13 Q8N1Q1 2/20 0.41
ALDH1A1 P00352 4/20 0.37
USP2 O75604 1/20 0.37
GAA P10253 1/20 0.37
PKM P14618 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TSHR P16473 2/20 0.35
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
BCL2 P10415 1/20 0.33
MCL1 Q07820 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC2 Q92769 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16683147 0.80 GRIA4 (0.37) CA12CA1CA2CA7CA13
SCHEMBL16683143 0.79 ALDH1A1 (0.40) ALDH1A1USP2GAAPKMHPGD
SCHEMBL16683136 0.79 MEN1 (0.40) CA12CA1CA2CA7CA13
SCHEMBL13713557 0.78 CA12 (0.49) CA12CA1CA2CA7CA13
SCHEMBL16683157 0.77 ALDH1A1 (0.38) ALDH1A1USP2GAAPKMHPGD
SCHEMBL16683159 0.77 ALDH1A1 (0.35) ALDH1A1USP2GAAPKMHPGD
SCHEMBL16081291 0.76 ALDH1A1 (0.47) CA12CA1CA2CA7CA13
SCHEMBL15189415 0.75 STAT3 (0.33) CA12CA1CA2CA7CA13
SCHEMBL16591096 0.75 CA12 (0.35) CA12CA1CA2CA7CA13
SCHEMBL16683137 0.75 ALDH1A1 (0.41) ALDH1A1USP2GAAPKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed