SCHEMBL16683137

SCHEMBL16683137

CCC(C)c1ccc(C(F)(F)c2c(F)c(F)c(S(=O)(=O)O)c(F)c2F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
TSHR P16473 2/20 0.34
GRIA4 P48058 2/20 0.33
USP2 O75604 1/20 0.33
GAA P10253 1/20 0.33
PKM P14618 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
HDAC4 P56524 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
LMNA P02545 1/20 0.32
TP53 P04637 1/20 0.32
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16683129 0.87 ALDH1A1 (0.39) ALDH1A1TSHRGRIA4USP2GAA
SCHEMBL16683155 0.79 MEN1 (0.43) ALDH1A1TSHRGRIA4USP2GAA
SCHEMBL16683136 0.78 MEN1 (0.40) ALDH1A1TSHRUSP2GAAPKM
SCHEMBL16683143 0.78 ALDH1A1 (0.40) ALDH1A1TSHRGRIA4USP2GAA
SCHEMBL16683159 0.76 ALDH1A1 (0.35) ALDH1A1TSHRUSP2GAAPKM
SCHEMBL16683157 0.76 ALDH1A1 (0.38) ALDH1A1TSHRGRIA4USP2GAA
SCHEMBL16683128 0.75 CA12 (0.41) ALDH1A1TSHRUSP2GAAPKM
SCHEMBL16081291 0.75 ALDH1A1 (0.47) ALDH1A1TSHRUSP2GAAPKM
SCHEMBL16683170 0.74 ALDH1A1 (0.43) ALDH1A1TSHRUSP2GAAPKM
SCHEMBL16683122 0.73 ALDH1A1 (0.44) ALDH1A1TSHRGRIA4USP2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed