SCHEMBL16690274

SCHEMBL16690274

CC(=O)O/N=C(/C)C(=O)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.57
MAPT P10636 5/20 0.52
L3MBTL1 Q9Y468 3/20 0.47
KMT2A Q03164 1/20 0.47
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
KDM4E B2RXH2 1/20 0.41
CES2 O00748 2/20 0.41
CES1 P23141 2/20 0.41
HPGD P15428 2/20 0.41
HSD17B10 Q99714 1/20 0.41
LMNA P02545 2/20 0.41
ALDH1A1 P00352 2/20 0.41
MAPK1 P28482 1/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
CTDSP1 Q9GZU7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL194894 0.90 CES2 (0.52) SMN1; SMN2MAPTL3MBTL1KMT2AKDM4E
SCHEMBL194893 0.90 CES2 (0.52) SMN1; SMN2MAPTL3MBTL1KMT2AKDM4E
SCHEMBL9900249 0.90 CES2 (0.52) SMN1; SMN2MAPTL3MBTL1KMT2AKDM4E
SCHEMBL17973405 0.85 SMN1; SMN2 (0.55) SMN1; SMN2MAPTL3MBTL1PDCD1CD274
SCHEMBL18978830 0.83 KMT2A (0.57) SMN1; SMN2MAPTL3MBTL1KMT2ACES2
SCHEMBL16690263 0.83 SMN1; SMN2 (0.60) SMN1; SMN2MAPTL3MBTL1PDCD1CD274
SCHEMBL19795435 0.83 HPGD (0.56) SMN1; SMN2MAPTL3MBTL1KMT2ACES2
SCHEMBL16019156 0.83 HPGD (0.56) SMN1; SMN2MAPTL3MBTL1KMT2ACES2
SCHEMBL16690221 0.80 CES1 (0.53) MAPTKMT2ACES2CES1LMNA
SCHEMBL11488533 0.79 SMN1; SMN2 (0.59) SMN1; SMN2MAPTL3MBTL1PDCD1CD274

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015064958-A1 NOVEL OXIME ESTER BIPHENYL COMPOUND, PHOTO INITIATOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 한국화학연구원 2015-05-07 WO disclosed