Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 8/20 | 0.46 |
| ▸ | AKR1C2 | P52895 | 8/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.45 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6589349 | 0.87 | TSHR (0.50) | AKR1C3AKR1C2RAB9ASMN1; SMN2TDP1 | |
| SCHEMBL12132604 | 0.87 | AKR1C3 (0.54) | CYP2A6AKR1C3AKR1C2 | |
| SCHEMBL22753250 | 0.85 | CYP2A6 (0.44) | CYP2A6HDAC8AKR1C3AKR1C2RAB9A | |
| SCHEMBL13544664 | 0.85 | PARP1 (0.47) | HDAC8SMN1; SMN2MAPTHDAC1HDAC6 | |
| SCHEMBL6586964 | 0.85 | HDAC8 (0.40) | CYP2A6HDAC8AKR1C3AKR1C2RAB9A | |
| SCHEMBL13254936 | 0.85 | TDP1 (0.44) | CYP2A6HDAC8AKR1C3AKR1C2RAB9A | |
| SCHEMBL6586968 | 0.84 | CES2 (0.39) | HDAC8AKR1C3AKR1C2RAB9ANPC1 | |
| SCHEMBL2054476 | 0.82 | HDAC8 (0.51) | HDAC8AKR1C3AKR1C2NPC1SMN1; SMN2 | |
| SCHEMBL15543469 | 0.82 | TDP1 (0.52) | HDAC8SMN1; SMN2MAPTTDP1HPGD | |
| SCHEMBL6590894 | 0.82 | HDAC8 (0.41) | CYP2A6HDAC8AKR1C3AKR1C2RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | claimed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | claimed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | claimed |
| US-20230288824-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230288847-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230288824-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230280668-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230280668-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230266683-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-08-24 | — | — | US | disclosed |
| US-20230266684-A1 | IMAGE FORMING UNIT AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-08-24 | — | — | US | disclosed |
| US-20230266684-A1 | IMAGE FORMING UNIT AND IMAGE FORMING APPARATUS | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2023-08-24 | — | — | US | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| US-7348335-B2 | Compositions useful as inhibitors of JAK and other protein kinases | VERTEX PHARMACEUTICALS INCORPORATED (US) | 2008-03-25 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | CYP2A6 3729/4885HDAC8 387/4885AKR1C3 782/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.