SCHEMBL166961

SCHEMBL166961

CCc1ccc2sc3ccccc3c(=O)c2c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.58
MAPT P10636 6/20 0.58
ALDH1A1 P00352 6/20 0.58
NPC1 O15118 4/20 0.58
RAB9A P51151 4/20 0.58
L3MBTL1 Q9Y468 3/20 0.58
TDP1 Q9NUW8 1/20 0.58
MAOA P21397 1/20 0.46
MAOB P27338 1/20 0.46
POLB P06746 2/20 0.44
HCRTR1 O43613 2/20 0.44
LMNA P02545 2/20 0.44
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
HPGD P15428 2/20 0.43
GAA P10253 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29422893 1.00 KDM4E (0.58) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL7044064 0.91 NPC1 (0.45) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL6860677 0.90 ALDH1A1 (0.50) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL725252 0.87 KDM4E (0.55) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL12075019 0.86 GPR3 (0.54) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL11053472 0.84 KDM4E (0.53) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL18123683 0.83 KDM4E (0.58) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL14607511 0.83 KDM4E (0.58) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL10803881 0.83 KDM4E (0.58) KDM4EMAPTALDH1A1NPC1RAB9A
SCHEMBL1041547 0.83 KDM4E (0.58) KDM4EMAPTALDH1A1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3370 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025041606-A1 METHOD FOR CURING PHOTOCURABLE COMPOSITION THROUGH UV-LED IRRADIATION, AND METHOD FOR PRODUCING CURED PRODUCT OF SAID PHOTOCURABLE COMPOSITION 信越化学工業株式会社 2025-02-27 WO claimed
CN-117965087-A Anti-dazzle coating, anti-dazzle hardening film and preparation method 宁波惠之星新材料科技股份有限公司 2024-05-03 CN claimed
CN-115785730-A UV (ultraviolet) light-cured solder resist ink and preparation method thereof 东莞智炜新材料股份有限公司 2023-03-14 CN claimed
CN-110205043-B Cutting adhesive tape for processing semiconductor material and preparation method thereof 广东硕成科技有限公司 2021-07-16 CN claimed
CN-110791150-A Curable resin composition for inkjet, printed wiring board, and method for producing printed wiring board 株式会社田村制作所 2020-02-14 CN claimed
EP-2820073-B1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK ELECTRONICS FOR IMAGING INC (US) 2018-09-05 EP claimed
US-10005915-B2 High-stretch energy curable inks and method of use in heat transfer label applications SUN CHEMICAL CORPORATION (US) 2018-06-26 US claimed
EP-3257677-A1 INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS Sun Chemical Corporation (US) 2017-12-20 EP claimed
US-9816016-B2 Adhesive composition, polarizing plate and liquid crystal display device LG CHEM, LTD. (KR) 2017-11-14 US claimed
US-9487680-B2 Pressure sensitive adhesive compositions, polarizers and liquid crystal displays comprising the same LG CHEM, LTD. (KR) 2016-11-08 US claimed
WO-2009131321-A2 PRESSURE-SENSITIVE ADHESIVE COMPOSITIONS, POLARIZERS AND LIQUID CRYSTAL DISPLAYS COMPRISING THE SAME LG CHEM, LTD. (KR) 2009-10-29 WO claimed
US-6815140-B2 COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 US claimed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US claimed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US claimed
EP-0626431-B1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2000-01-26 EP claimed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP claimed
US-5998013-A CURED PRODUCT OF AN ULTRAVIOLET-CURING RESIN AND AGGLOMERATES OF COLLOIDAL SILICA PARTICLES FORMED WITH AN AMINE LINTEC CORPORATION (JP) 1999-12-07 US claimed
US-5429846-A Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent SEKISUI CHEMICAL CO., LTD. (JP) 1995-07-04 US claimed
EP-0626431-A1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 1994-11-30 EP claimed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed