SCHEMBL1669744

SCHEMBL1669744

N=C=O.N=C=O.N=C=O.[SiH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27784783 1.00
SCHEMBL3338549 1.00
SCHEMBL706082 1.00
SCHEMBL647320 1.00
SCHEMBL389045 1.00
SCHEMBL315171 1.00
SCHEMBL1289864 1.00
SCHEMBL10891818 1.00
SCHEMBL21880102 1.00
Fluoride SCHEMBL4973760 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106750448-A Scribble the painting products of the painting composition for makrolon glazing 现代自动车株式会社 2017-05-31 CN claimed
CN-103204639-B The preparation method of dustproof automotive glass SAIC CHERY AUTOMOBILE CO., LTD. (CN) 2016-06-01 CN claimed
CN-103204639-A Preparation method of dustproof automobile glass CHERY AUTOMOBILE CO LTD 2013-07-17 CN claimed
CN-101726085-B Condensed water treatment device of air conditioner IND TECH RES INST 2012-07-25 CN claimed
CN-101726085-A Condensed water treatment device of air conditioner IND TECH RES INST 2010-06-09 CN claimed
CN-100547036-C The crosslinked silicon-containing copolymer and the solidifying product prepared therefrom of the composition of silicon-containing copolymer, dissolvable agents dissolving AZ ELECTRONIC MATERIAL K K (JP) 2009-10-07 CN claimed
CN-100540153-C Hydrophobic structure on surface of substrate and preparation method thereof IND TECH RES INST (CN) 2009-09-16 CN claimed
CN-100494472-C Hydrophobic structure and method for making same IND TECH RES INST (CN) 2009-06-03 CN claimed
CN-1990899-A Hydrophobic structure and method for making same IND TECH RES INST (CN) 2007-07-04 CN claimed
CN-1827237-A Hydrophobic structure on surface of substrate and preparation method thereof IND TECH RES INST (CN) 2006-09-06 CN claimed
CN-1643066-A Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom AZ ELECTRONIC MATERIAL K K (JP) 2005-07-20 CN claimed
JP-5025302-A None JP disclosed
CN-117202984-A Polyimide porous film 东京应化工业株式会社 2023-12-08 CN disclosed
CN-117126642-A Adhesive metal high-temperature vulcanized fluorosilicone rubber and preparation and use methods thereof 新元化学(山东)股份有限公司 2023-11-28 CN disclosed
EP-4225964-A1 SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS Versum Materials US, LLC (US) 2023-08-16 EP disclosed
JP-H0525302-A RELEASE FILM HAVING ANTISTATIC PROPERTIES TEIJIN LTD 1993-02-02 JP disclosed
CN-1053249-A The fluorinated copolymer composition MITSUI PETROCHEMICAL IND (JP) 1991-07-24 CN disclosed
EP-0326961-A2 Method for producing laundry-resistant recorded medium KANZAKI PAPER MANUFACTURING CO., LTD. (JP) 1989-08-09 EP disclosed
US-4433127-A SILYL ISOCYANATE, ORGANO-TITANIUM-OXYGEN-PHOSPHORUS COMPOUND MATSUMOTO SEIYAKU KOGYO KABUSHIKI KAISHA (JP) 1984-02-21 US disclosed
US-4176131-A Chemical process BRISTOL-MYERS COMPANY (US) 1979-11-27 US disclosed