SCHEMBL389045

SCHEMBL389045

N=C=O.N=C=O.N=C=O.N=C=O.[Si]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27784783 1.00
SCHEMBL3338549 1.00
SCHEMBL706082 1.00
SCHEMBL647320 1.00
SCHEMBL315171 1.00
SCHEMBL1289864 1.00
SCHEMBL10891818 1.00
SCHEMBL1669744 1.00
SCHEMBL21880102 1.00
Fluoride SCHEMBL4973760 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6817211-B2 HIGH PURITY DIRECT DEPOSIT VITRIFIED SILICON OXYFLUORIDE GLASS SUITABLE FOR USE AS A PHOTOMASK SUBSTRATES FOR PHOTOLITHOGRAPHY APPLICATIONS IN THE VUV WAVELENGTH REGION BELOW 190 NM IS DISCLOSED. THE INVENTIVE DIRECT DEPOSIT CORNING INCORPORATED 2004-11-16 US claimed
US-6732551-B2 Method and feedstock for making silica CORNING INCORPORATED 2004-05-11 US claimed
EP-0729954-B1 Substituted thiophene sulfonyl ureas and thioureas, process for their preparation, their use as medicaments HOECHST AG (DE) 2003-09-03 EP claimed
US-20030148194-A1 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks BROWN JOHN T (US) 2003-08-07 US claimed
EP-1330680-A1 VACUUM ULTRAVIOLET TRANSMITTING DIRECT DEPOSIT VITRIFIED SILICON OXYFLUORIDE LITHOGRAPHY GLASS PHOTOMASK BLANKS CORNING INCORPORATED (US) 2003-07-30 EP claimed
US-6506937-B2 Used as antiarrhythmics SANOFI-AVENTIS DEUTSCHLAND GMBH (DE) 2003-01-14 US claimed
WO-2002090273-A1 METHOD AND USE OF A FEEDSTOCK FOR MAKING SILICA GLASS CORNING INCORPORATED (US) 2002-11-14 WO claimed
US-20020162359-A1 Method and feedstock for making silica CORNING INCORPORATED 2002-11-07 US claimed
US-20020058838-A1 Substituted benzenesulfonylureas and -thioureas-processes for their preparation and their use as pharmaceuticals HOECHST AKTIENGESELLSCHAFT 2002-05-16 US claimed
WO-2002021217-A1 VACUUM ULTRAVIOLET TRANSMITTING DIRECT DEPOSIT VITRIFIED SILICON OXYFLUORIDE LITHOGRAPHY GLASS PHOTOMASK BLANKS CORNING INCORPORATED (US) 2002-03-14 WO claimed
EP-0727416-B1 Substituted benzenesulfonylureas and -thioureas, process for their preparation, their use as medicament or diagnostic agent, as well as medicaments containing them HOECHST AG (DE) 2000-01-26 EP claimed
EP-0657423-B1 Aminosubstituted benzoylsulfonylurea and thiourea derivatives, process for their preparation and their use as pharmaceuticals HOECHST AG (DE) 1998-12-30 EP claimed
US-5792788-A FOR TREATMENT OF CARDIAC DISORDERS HOECHST AKTIENGESELLSCHAFT (DE) 1998-08-11 US claimed
US-5698596-A ANTIARRHYTHMIA AGENTS HOECHST AKTIENGESELLSCHAFT (DE) 1997-12-16 US claimed
EP-0558635-B1 IMPROVED MATRIX METALLOPROTEASE INHIBITORS GLYCOMED INC (US) 1997-09-10 EP claimed
US-5652268-A TREATING CARDIOVASCULAR DISORDERS HOECHST AKTIENGESELLSCHAFT (DE) 1997-07-29 US claimed
EP-0612724-B1 Substituted benzenesulfonylureas and -thioureas, process for their preparation and their use as pharmaceuticals HOECHST AG (DE) 1996-12-27 EP claimed
EP-0558635-A4 IMPROVED MATRIX METALLOPROTEASE INHIBITORS 1993-11-24 EP claimed
EP-0558635-A1 IMPROVED MATRIX METALLOPROTEASE INHIBITORS. GLYCOMED INC (US) 1993-09-08 EP claimed
WO-1992009563-A1 IMPROVED MATRIX METALLOPROTEASE INHIBITORS GLYCOMED, INC. (US) 1992-06-11 WO claimed