SCHEMBL1670464

SCHEMBL1670464

CCOCC(CC)(CC)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.34
CYP4A11 Q02928 1/20 0.34
ALDH1A1 P00352 3/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
THRB P10828 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18994694 0.82 PTGS1 (0.34) ALDH1A1TSHRMEN1CYP1A2THRB
SCHEMBL13104260 0.80 LMNA (0.31)
SCHEMBL15898434 0.78 ALDH1A1 (0.38) CYP4F2CYP4A11ALDH1A1TSHRTHRB
SCHEMBL13592225 0.78 CYP4F2 (0.31) CYP4F2CYP4A11ALDH1A1MEN1CYP1A2
SCHEMBL13354487 0.78 CYP4F2 (0.31) CYP4F2CYP4A11ALDH1A1MEN1CYP1A2
SCHEMBL7139411 0.77
SCHEMBL13104536 0.77 THRB (0.35) CYP4F2CYP4A11THRB
SCHEMBL173322 0.76 FFAR3 (0.41) CYP4F2CYP4A11ALDH1A1TSHRMEN1
SCHEMBL4961008 0.75 CYP2C9 (0.39) CYP4F2CYP4A11ALDH1A1TSHRTHRB
SCHEMBL5050665 0.74 TSHR (0.41) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0919850-B1 Active matrix liquid-crystal display device and method for making the same NEC LCD TECHNOLOGIES LTD (JP) 2008-08-27 EP claimed
EP-0851880-B1 FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM CLARIANT FINANCE BVI LTD (VG) 2000-06-28 EP claimed
EP-0754975-B1 Process of reducing trace levels of metal impurities from resist components OLIN CORP (US) 1999-09-01 EP claimed
EP-0800542-B1 ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB-SURFACE FORCED STEAM DISTILLATION CLARIANT FINANCE BVI LTD (VG) 1998-08-19 EP claimed
EP-4479994-A1 COMPOSITE STRUCTURE AND MANUFACTURING METHOD THEREOF SOITEC (FR) 2024-12-25 EP disclosed
WO-2023156193-A1 COMPOSITE STRUCTURE AND MANUFACTURING METHOD THEREOF SOITEC (FR) 2023-08-24 WO disclosed
WO-2023047035-A1 METHOD FOR FABRICATING A POLYCRYSTALLINE SILICON CARBIDE CARRIER SUBSTRATE SOITEC (FR) 2023-03-30 WO disclosed
EP-2482996-A1 METHOD FOR THE SPOT REPAIR OF SCRATCH-RESISTANT PAINT FILMS BASF Coatings Japan Ltd. (JP) 2012-08-08 EP disclosed
WO-2011039581-A1 METHOD FOR THE SPOT REPAIR OF SCRATCH-RESISTANT PAINT FILMS BASF COATINGS JAPAN LTD. (JP) 2011-04-07 WO disclosed