SCHEMBL1671879

SCHEMBL1671879

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.36
TSHR P16473 1/20 0.36
STS P08842 2/20 0.35
KMT2A Q03164 3/20 0.35
MAPT P10636 3/20 0.33
MEN1 O00255 2/20 0.33
POLB P06746 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
PPARG P37231 1/20 0.33
PRKCA P17252 1/20 0.33
MAPK1 P28482 1/20 0.33
HIF1A Q16665 1/20 0.33
CXCR2 P25025 2/20 0.32
TDP1 Q9NUW8 3/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MGLL Q99685 1/20 0.32
CXCR1 P25024 1/20 0.32
F2 P00734 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL246106 0.84 TSHR (0.39) TP53TSHRKMT2AMAPTNPC1
SCHEMBL1673158 0.82 KMT2A (0.33) TP53TSHRKMT2AMAPTMEN1
SCHEMBL1671877 0.81 ESR1 (0.39) TP53TSHRKMT2APRKCAMAPK1
SCHEMBL1672501 0.79 ELANE (0.45) KMT2AMAPTMEN1POLBNPC1
SCHEMBL547364 0.79 MAPT (0.41) TP53TSHRKMT2AMAPTPOLB
SCHEMBL2882269 0.78 TSHR (0.42) TP53TSHRKMT2AMAPTMEN1
SCHEMBL10144812 0.78 TSHR (0.42) TP53TSHRKMT2AMAPTMEN1
SCHEMBL1671636 0.78 PDCD1 (0.44) TP53TSHRKMT2AMAPTPDCD1
SCHEMBL382685 0.78 TSHR (0.47) TP53TSHRKMT2AMAPTMEN1
Hydrogen Sulfide SCHEMBL2882266 0.76 TSHR (0.46) TP53TSHRKMT2AMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP disclosed
US-7919226-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-05 US disclosed
US-7511169-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20080318160-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process RITTAL GMBH & CO. KG (DE) 2008-12-25 US disclosed
US-20060228648-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-10-12 US disclosed
EP-1710230-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2006-10-11 EP disclosed