SCHEMBL2882269

SCHEMBL2882269

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)OS)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
TP53 P04637 1/20 0.42
KMT2A Q03164 2/20 0.40
MGLL Q99685 2/20 0.38
LMNA P02545 3/20 0.37
F2 P00734 1/20 0.37
PDCD1 Q15116 1/20 0.36
CD274 Q9NZQ7 1/20 0.36
CES1 P23141 1/20 0.35
MAPK1 P28482 1/20 0.35
HIF1A Q16665 1/20 0.35
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
ALDH1A1 P00352 3/20 0.35
NPC1 O15118 1/20 0.35
HTT P42858 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
PRKCA P17252 1/20 0.35
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10144812 0.86 TSHR (0.42) TSHRTP53KMT2AMGLLLMNA
SCHEMBL382685 0.85 TSHR (0.47) TSHRTP53KMT2AMGLLLMNA
Hydrogen Sulfide SCHEMBL2882266 0.84 TSHR (0.46) TSHRTP53KMT2AMGLLLMNA
SCHEMBL482458 0.84 TSHR (0.46) TSHRTP53KMT2AMGLLLMNA
SCHEMBL19042453 0.82 TSHR (0.45) TSHRTP53KMT2AMGLLLMNA
SCHEMBL246107 0.82 TSHR (0.40) TSHRTP53KMT2AMGLLLMNA
SCHEMBL482457 0.81 TSHR (0.44) TSHRTP53KMT2AMGLLLMNA
SCHEMBL4763671 0.81 TSHR (0.57) TSHRTP53KMT2AMGLLLMNA
SCHEMBL18785766 0.80 TP53 (0.42) TSHRTP53KMT2ALMNAF2
SCHEMBL27860967 0.79 KMT2A (0.44) TSHRTP53KMT2ALMNAF2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146247-B1 Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO (JP) 2015-04-15 EP disclosed
EP-2146247-A1 Resist patterning process and manufacturing photo mask Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed