SCHEMBL16730127

SCHEMBL16730127

COc1ccc(C(C)(C)OC(=O)NCCc2ccccc2)cc1

nearest known ligand 0.67

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.67
RAB9A P51151 2/20 0.67
TAAR1 Q96RJ0 2/20 0.67
GAA P10253 1/20 0.67
PLAAT3 P53816 3/20 0.56
PLAAT5 Q96KN8 3/20 0.56
PLAAT2 Q9NWW9 3/20 0.56
PLAAT4 Q9UL19 3/20 0.56
ALDH1A1 P00352 1/20 0.56
KMT2A Q03164 3/20 0.54
GLA P06280 1/20 0.54
FPR2 P25090 1/20 0.54
PTPN1 P18031 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.52
MEN1 O00255 1/20 0.52
ATM Q13315 1/20 0.52
MAPT P10636 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8757522 0.81 GLA (0.67) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL572740 0.79 IDO1 (0.60) NPC1RAB9ATAAR1GAAALDH1A1
SCHEMBL7705937 0.78 ALDH1A1 (0.76) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL8737718 0.77 NPC1 (0.72) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL7025642 0.76 NPC1 (0.55) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL4322629 0.76 GLA (0.77) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL2095490 0.75 TAAR1 (0.69) NPC1RAB9ATAAR1GAAPLAAT3
SCHEMBL25054511 0.75 NPC1 (0.55) NPC1RAB9ATAAR1GAAALDH1A1
SCHEMBL8736454 0.75 NPC1 (0.55) NPC1RAB9ATAAR1GAAALDH1A1
SCHEMBL2335992 0.75 KMT2A (0.71) NPC1RAB9ATAAR1GAAPLAAT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9417528-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-16 US disclosed
US-20150248056-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-03 US disclosed
US-20150140484-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-05-21 US disclosed