⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2230626 | 1.00 | — | — | |
| SCHEMBL1673263 | 1.00 | — | — | |
| SCHEMBL2231137 | 1.00 | — | — | |
| SCHEMBL1673265 | 1.00 | — | — | |
| SCHEMBL2232076 | 1.00 | — | — | |
| SCHEMBL1672487 | 1.00 | — | — | |
| SCHEMBL180754 | 0.97 | — | — | |
| SCHEMBL312936 | 0.86 | — | — | |
| SCHEMBL17385702 | 0.69 | — | — | |
| SCHEMBL19180789 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6309796-B1 | PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-30 | — | — | US | claimed |
| US-12044094-B2 | Plug, downhole tool, and well treatment method | KUREHA CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| WO-2024043084-A1 | RESIN COMPOSITION, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATE, AND WIRING BOARD | パナソニックＩＰマネジメント株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043083-A1 | RESIN COMPOSITION, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATED PLATE, AND WIRING BOARD | パナソニックＩＰマネジメント株式会社 | 2024-02-29 | — | — | WO | disclosed |
| US-20230374880-A1 | PLUG, DOWNHOLE TOOL, AND WELL TREATMENT METHOD | KUREHA CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| EP-4227355-A1 | PLUG, DOWNHOLE TOOL, AND WELL TREATING METHOD | Kureha Corporation (JP) | 2023-08-16 | — | — | EP | disclosed |
| US-11702504-B2 | Resin composition for printed wiring board, prepreg, laminate, metal foil-clad laminate, printed wiring board, and multilayer printed wiring board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-20230192989-A1 | POLYAMIDE RESIN COMPOSITION, MOLDED POLYAMIDE RESIN ARTICLE, AND PRODUCTION METHOD THEREFOR | KUREHA CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230113512-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-13 | — | — | US | disclosed |
| US-20110224385-A1 | RESIN COMPOSITION COMPRISING A CYCLIC CARBODIIMIDE | TEIJIN LIMITED (JP) | 2011-09-15 | — | — | US | disclosed |
| EP-2360208-A1 | RESIN COMPOSITION CONTAINING CYCLIC CARBODIMIDE | Teijin Limited (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-1930382-B1 | COATING MATERIALS CONSISTING OF LOW- OR MEDIUM-MOLECULAR ORGANIC COMPOUNDS | CENTRAL GLASS CO LTD (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-7919224-B2 | Coating materials consisting of low- or medium-molecular organic compounds | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20090272295-A1 | Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-1930382-A1 | COATING MATERIALS CONSISTING OF LOW- OR MEDIUM-MOLECULAR ORGANIC COMPOUNDS | Central Glass Company, Limited (JP) | 2008-06-11 | — | — | EP | disclosed |
| US-6730453-B2 | POLYSILSESQUIOXANE POLYMERS CONTAINING CARBOXY OR HYDROXY GROUPS, AND A PHOTOACID GENERATOR | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-20020058205-A1 | High molecular weight silicone compounds, resist compositions, and patterning method | NAKASHIMA MUTSUO (JP) | 2002-05-16 | — | — | US | disclosed |
| US-6309796-B1 | PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |