SCHEMBL16744360

SCHEMBL16744360

CCC(C)(C)C(=O)CC12CC3CC(CC(C3)C1C)C2

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
HSD11B1 P28845 3/20 0.32
KMT2A Q03164 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2812495 0.77 ALDH1A1 (0.39) ALDH1A1HSD11B1SMN1; SMN2
SCHEMBL13932775 0.74 ALDH1A1 (0.33) ALDH1A1KMT2A
SCHEMBL2832307 0.72 ALDH1A1 (0.34) ALDH1A1HSD11B1SMN1; SMN2
SCHEMBL28120624 0.72 ALDH1A1 (0.34) ALDH1A1EPHX2
SCHEMBL2733974 0.72 CYP17A1 (0.33) ALDH1A1KMT2AEPHX2
SCHEMBL1937747 0.70 GRIN2D (0.32)
SCHEMBL17773490 0.70 ALDH1A1 (0.35) ALDH1A1HSD11B1KMT2ASMN1; SMN2EPHX2
SCHEMBL13059593 0.70 MEN1 (0.31) ALDH1A1KMT2A
SCHEMBL14118984 0.68 KMT2A (0.33) ALDH1A1HSD11B1KMT2ASMN1; SMN2EPHX2
SCHEMBL17147877 0.68 HSD11B1 (0.34) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9547240-B2 Resin, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-01-17 US disclosed
US-20150147695-A1 RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-05-28 US disclosed