Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2812495 | 0.83 | ALDH1A1 (0.39) | ALDH1A1SMN1; SMN2NPSR1HSD11B1 | |
| SCHEMBL1482227 | 0.81 | ALDH1A1 (0.33) | ALDH1A1SMN1; SMN2NPSR1HSD11B1 | |
| SCHEMBL6559876 | 0.79 | HSD11B1 (0.33) | ALDH1A1HSD11B1 | |
| SCHEMBL28120624 | 0.74 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL704030 | 0.73 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2NPSR1HSD11B1 | |
| SCHEMBL16744360 | 0.72 | ALDH1A1 (0.33) | ALDH1A1SMN1; SMN2HSD11B1 | |
| SCHEMBL1902323 | 0.71 | MAPT (0.32) | ALDH1A1 | |
| SCHEMBL20920212 | 0.71 | ALDH1A1 (0.37) | ALDH1A1 | |
| Methacrylic Acid SCHEMBL27952368 | 0.70 | MAPT (0.31) | — | |
| SCHEMBL1937747 | 0.69 | GRIN2D (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | claimed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
| US-9557646-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-31 | — | — | US | disclosed |
| US-20150355542-A1 | PHENOLIC POLYMERS AND PHOTORESISTS COMPRISING SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-12-10 | — | — | US | disclosed |
| EP-2829532-A1 | Hydroxyphenyl acrylate monomers and polymers | Rohm and Haas Company (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8932793-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-13 | — | — | US | disclosed |
| EP-1645554-B1 | NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM | CENTRAL GLASS CO LTD (JP) | 2010-12-08 | — | — | EP | disclosed |
| US-7750178-B2 | Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| EP-1970762-B1 | Phenolic polymers and photoresists comprising same | ROHM & HAAS ELECT MAT (US) | 2009-12-16 | — | — | EP | disclosed |
| US-20080227031-A1 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-09-18 | — | — | US | disclosed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | disclosed |
| US-20030232274-A1 | Photoacid-labile polymers and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-12-18 | — | — | US | disclosed |
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | disclosed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | disclosed |
| US-6492086-B1 | TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES | SHIPLEY COMPANY, L.L.C. | 2002-12-10 | — | — | US | disclosed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | disclosed |
| US-20010049075-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-12-06 | — | — | US | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| EP-1035441-A1 | Pattern formation method | Matsushita Electric Industrial Co., Ltd. (JP) | 2000-09-13 | — | — | EP | disclosed |