SCHEMBL16765441

SCHEMBL16765441

O=C1C2C3C=CC(O3)C2C(=O)N1OS(=O)(=O)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.38
NOX4 Q9NPH5 2/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
PTGS2 P35354 1/20 0.36
ATM Q13315 1/20 0.36
ENPP3 O14638 4/20 0.35
ENPP1 P22413 3/20 0.35
ENPP2 Q13822 3/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
KIF11 P52732 1/20 0.35
AKR1B1 P15121 1/20 0.35
CYP3A4 P08684 1/20 0.34
PARL Q9H300 2/20 0.34
VDR P11473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4831892 0.87 KMT2A (0.43) ALDH1A1NOX4MEN1KMT2APTGS2
SCHEMBL3182683 0.86 KMT2A (0.50) ALDH1A1MEN1KMT2AATMCYP3A4
SCHEMBL6420670 0.85 KMT2A (0.39) ALDH1A1NOX4MEN1KMT2APTGS2
SCHEMBL2070882 0.82 VDR (0.52) ALDH1A1MEN1KMT2AATMCA1
SCHEMBL548362 0.82 NOX4 (0.39) ALDH1A1NOX4MEN1KMT2APTGS2
SCHEMBL4834153 0.78 PTGS2 (0.41) ALDH1A1NOX4MEN1KMT2APTGS2
SCHEMBL2069720 0.77 KMT2A (0.43) ALDH1A1MEN1KMT2AATMCYP3A4
SCHEMBL29369870 0.77 KMT2A (0.43) ALDH1A1MEN1KMT2AATMCYP3A4
SCHEMBL14410627 0.76 ATM (0.42) ALDH1A1ATMCYP3A4
SCHEMBL14448183 0.76 ATM (0.42) ALDH1A1ATMCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448474-B2 Positive photosensitive resin composition and pattern forming method CHI MEI CORPORATION (TW) 2016-09-20 US disclosed
US-20150160554-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2015-06-11 US disclosed