SCHEMBL16767129

SCHEMBL16767129

C=Cc1ccccc1[SiH](C)Cl

nearest known ligand 0.46

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL388507 0.82 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL1493095 0.82 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL5697732 0.77 ALDH1A1 (0.40) ALDH1A1TSHR
SCHEMBL9491445 0.74 ALDH1A1 (0.42) ALDH1A1
Styrene SCHEMBL28947868 0.74 ALDH1A1 (0.54) ALDH1A1TSHR
SCHEMBL10614948 0.73 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL30402501 0.73 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL3422344 0.72 ALDH1A1 (0.40) ALDH1A1TSHR
SCHEMBL3861883 0.72 ALDH1A1 (0.40) ALDH1A1TSHR
SCHEMBL143427 0.72 ALDH1A1 (0.40) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102015837-B Sulfur modified silanes for the elaboration of high refractive index materials ESSILOR INT 2012-12-05 CN claimed
CN-102597026-A Process and catalyst system for polydiene production BRIDGESTONE CORP 2012-07-18 CN claimed
CN-102015837-A Sulfur modified silanes for the elaboration of high refractive index materials ESSILOR INT 2011-04-13 CN claimed
CN-101098911-A Ultraviolet transmissive polyhedral silsequioxane polymers MATSUSHITA ELECTRIC WORKS LTD (JP) 2008-01-02 CN claimed
CN-114853802-B Gluconolide derivative and preparation method, pharmaceutical composition and application thereof 河北康泰药业有限公司 2023-11-28 CN disclosed
US-10759119-B2 Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object SEIKO EPSON CORPORATION (JP) 2020-09-01 US disclosed
US-20190054704-A1 THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT SEIKO EPSON CORPORATION (JP) 2019-02-21 US disclosed
US-10137637-B2 Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object SEIKO EPSON CORPORATION (JP) 2018-11-27 US disclosed
US-20150239147-A1 THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT SEIKO EPSON CORPORATION (JP) 2015-08-27 US disclosed
US-20150239175-A1 THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT SEIKO EPSON CORPORATION (JP) 2015-08-27 US disclosed
EP-2910363-A1 THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT Seiko Epson Corporation (JP) 2015-08-26 EP disclosed
US-20150165680-A1 THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT SEIKO EPSON CORPORATION (JP) 2015-06-18 US disclosed
CN-102348974-A Process for producing filler, filler, and column SHISEIDO CO LTD 2012-02-08 CN disclosed
CN-102089390-A Metal effect pigments, method for the production and the use thereof and powder coating ECKART GMBH 2011-06-08 CN disclosed
CN-102015837-A Sulfur modified silanes for the elaboration of high refractive index materials ESSILOR INT 2011-04-13 CN disclosed
CN-101394714-B Method for producing multilayered wiring substrate, multilayered wiring substrate, and electronic apparatus SEIKO EPSON CORP 2011-02-23 CN disclosed
CN-101394714-A Method for producing multilayered wiring substrate, multilayered wiring substrate, and electronic apparatus SEIKO EPSON CORP (JP) 2009-03-25 CN disclosed
CN-101098911-A Ultraviolet transmissive polyhedral silsequioxane polymers MATSUSHITA ELECTRIC WORKS LTD (JP) 2008-01-02 CN disclosed
CN-1269825-C Compound comprising vinyl silane and functionality of electron donor or acceptor NAT STARCH CHEM INVEST (US) 2006-08-16 CN disclosed
CN-1524863-A Compound comprising vinyl silane and functionality of electron donor or acceptor 国家淀粉及化学投资控股公司 2004-09-01 CN disclosed