Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 9/20 | 0.45 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CCR2 | P41597 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA3 | P07451 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | CA6 | P23280 | 1/20 | 0.30 |
| ▸ | CA5A | P35218 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.30 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.30 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16769833 | 0.92 | RIPK1 (0.43) | RIPK1FKBP1ACCR2LMNACA12 | |
| SCHEMBL22425373 | 0.78 | MEN1 (0.47) | RIPK1POLBMEN1KMT2A | |
| SCHEMBL18416061 | 0.76 | RIPK1 (0.40) | RIPK1FKBP1APOLBMEN1KMT2A | |
| SCHEMBL18416062 | 0.73 | RECQL (0.43) | RIPK1POLBMEN1KMT2A | |
| SCHEMBL17589150 | 0.73 | LMNA (0.52) | RIPK1POLBMEN1KMT2ALMNA | |
| SCHEMBL21880723 | 0.72 | RIPK1 (0.49) | RIPK1KMT2A | |
| SCHEMBL12107375 | 0.71 | RIPK1 (0.36) | RIPK1FKBP1A | |
| SCHEMBL9916111 | 0.71 | RIPK1 (0.42) | RIPK1FKBP1A | |
| SCHEMBL13511563 | 0.69 | POLB (0.37) | POLBLMNA | |
| SCHEMBL2377717 | 0.69 | POLB (0.50) | POLBLMNACA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9639002-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20160116843-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-28 | — | — | US | disclosed |
| US-20150153644-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-04 | — | — | US | disclosed |