Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 8/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.35 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.34 |
| ▸ | CCR2 | P41597 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 3/20 | 0.32 |
| ▸ | CNR2 | P34972 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16769835 | 0.92 | RIPK1 (0.45) | RIPK1LMNACA12CA1CA2 | |
| SCHEMBL17589150 | 0.78 | LMNA (0.52) | RIPK1LMNACA12CA1CA2 | |
| SCHEMBL18416061 | 0.73 | RIPK1 (0.40) | RIPK1FKBP1ATSHR | |
| SCHEMBL18416062 | 0.70 | RECQL (0.43) | RIPK1TSHR | |
| SCHEMBL22425373 | 0.70 | MEN1 (0.47) | RIPK1 | |
| SCHEMBL21880723 | 0.69 | RIPK1 (0.49) | RIPK1CNR1CNR2 | |
| SCHEMBL16769831 | 0.68 | ALDH1A1 (0.39) | RIPK1FKBP1A | |
| SCHEMBL11424950 | 0.68 | BCHE (0.40) | LMNACA12CA1CA2CA3 | |
| SCHEMBL9916053 | 0.68 | RIPK1 (0.39) | RIPK1FKBP1ACCR2 | |
| SCHEMBL9916111 | 0.68 | RIPK1 (0.42) | RIPK1FKBP1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20150153644-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-04 | — | — | US | disclosed |