Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.32 |
| ▸ | FABP4 | P15090 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9966116 | 0.77 | SLC2A1 (0.34) | SLC2A1 | |
| SCHEMBL18561740 | 0.77 | CASP1 (0.40) | ALDH1A1 | |
| SCHEMBL18219814 | 0.77 | SLC2A1 (0.33) | SLC2A1FABP4ALDH1A1 | |
| SCHEMBL12040205 | 0.77 | FABP4 (0.31) | TSHRSLC2A1FABP4HTTMCOLN3 | |
| SCHEMBL16638146 | 0.75 | — | — | |
| SCHEMBL15450682 | 0.75 | CDC25B (0.40) | FABP4 | |
| SCHEMBL682247 | 0.74 | ALDH1A1 (0.43) | TSHRALDH1A1 | |
| SCHEMBL16638365 | 0.74 | ALDH1A1 (0.39) | TSHRSLC2A1HTTALDH1A1 | |
| SCHEMBL2742165 | 0.74 | CAPN1 (0.30) | SLC2A1LMNA | |
| SCHEMBL12040222 | 0.72 | HPGDS (0.36) | SLC2A1FABP4ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9005870-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20110318693-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |