SCHEMBL16821065

SCHEMBL16821065

C=CC(=O)Oc1cccc(-c2ccccc2)c1

nearest known ligand 0.61

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.50
FABP7 O15540 1/20 0.50
FABP3 P05413 1/20 0.50
FABP5 Q01469 1/20 0.50
FAAH O00519 1/20 0.49
ALOX5 P09917 1/20 0.49
RXRA P19793 1/20 0.47
RXRB P28702 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30833341 1.00 EPHX1 (0.50) EPHX1FABP7FABP3FABP5FAAH
Acetic Acid SCHEMBL6685149 0.95 MAPT (0.48) EPHX1FABP7FABP3FABP5FAAH
SCHEMBL379254 0.94 MEN1 (0.45) EPHX1FABP7FABP3FABP5FAAH
SCHEMBL2123666 0.91 MAPT (0.47) EPHX1FABP7FABP3FABP5RXRA
SCHEMBL9915697 0.88 RXRA (0.43) EPHX1FABP7FABP3FABP5RXRA
SCHEMBL28005885 0.88 LMNA (0.50)
SCHEMBL19524158 0.86 ESR1 (0.49)
SCHEMBL2124788 0.86 PLG (0.44) RXRARXRB
SCHEMBL29048690 0.85 PIK3CA (0.44) ALOX5
SCHEMBL421454 0.85 KMT2A (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118772198-A Efficient synthesis of phosphoryl method for preparing triethyl glycolate 湖北兴发化工集团股份有限公司 2024-10-15 CN disclosed
CN-113337170-B Curable composition, cured product, near infrared absorbing filter, and method for producing same 东京应化工业株式会社 2024-04-05 CN disclosed
CN-115038730-A Resin composition for stereolithography 可乐丽则武齿科株式会社 2022-09-09 CN disclosed
CN-114828803-A Dental restorative composition 可乐丽则武齿科株式会社 2022-07-29 CN disclosed
CN-113677293-A Curable composition for dental repair 可乐丽则武齿科株式会社 2021-11-19 CN disclosed
CN-113337170-A Curable composition, cured product, near-infrared absorption filter, and method for producing same 东京应化工业株式会社 2021-09-03 CN disclosed
WO-2021132463-A1 DENTAL RESTORATION MATERIAL COMPOSITION クラレノリタケデンタル株式会社 2021-07-01 WO disclosed
CN-111971318-A Photocurable resin composition 可乐丽则武齿科株式会社 2020-11-20 CN disclosed
US-20160179004-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM CHI MEI CORPORATION (TW) 2016-06-23 US disclosed
US-9260554-B2 Copolymer, monomer composition, resin solution, and resin film SHOWA DENKO K.K. (JP) 2016-02-16 US disclosed
US-20150175729-A1 COPOLYMER, MONOMER COMPOSITION, RESIN SOLUTION, AND RESIN FILM RESONAC CORPORATION (JP) 2015-06-25 US disclosed