SCHEMBL168235

SCHEMBL168235

CCN(CC)C(C)=Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
ALDH1A1 P00352 4/20 0.45
TSHR P16473 1/20 0.45
AKR1C3 P42330 1/20 0.45
RECQL P46063 1/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
FBP1 P09467 1/20 0.41
HSD17B10 Q99714 1/20 0.41
NR1I2 O75469 1/20 0.41
LMNA P02545 2/20 0.40
KDM1A O60341 2/20 0.40
HPGD P15428 2/20 0.39
MAPT P10636 1/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12411254 1.00 NPC1 (0.50) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
Sulfuric Acid SCHEMBL10585237 0.91 L3MBTL1 (0.47) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL28776382 0.82 ALDH1A1 (0.44) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL27879910 0.80 L3MBTL1 (0.47) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL12411252 0.78 NPC1 (0.49) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL3679761 0.78 L3MBTL1 (0.49) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL8859063 0.78 NPC1 (0.49) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL11206642 0.78 NPC1 (0.49) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL3951056 0.77 NPC1 (0.53) NPC1L3MBTL1ALDH1A1TSHRAKR1C3
SCHEMBL629143 0.76 ALDH1A1 (0.52) NPC1L3MBTL1ALDH1A1TSHRAKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109148796-A Acid for lithium ion electrochemical cells power-performance removes function diaphragm 通用汽车环球科技运作有限责任公司 2019-01-04 CN claimed
CN-101987081-B Controlled release preparation SHUGUANG ZHONG 2012-08-08 CN claimed
EP-1149075-B1 SYNTHESIS OF DITHIOESTER CHAIN TRANSFER AGENTS COMMW SCIENT IND RES ORG (AU) 2008-12-31 EP claimed
EP-0791016-B1 POLYMER SYNTHESIS DU PONT (US) 2000-07-12 EP claimed
EP-4004125-B1 MIXING SYSTEM FOR PREPARING LOW VOC AQUEOUS COATING AGENTS BASF COATINGS GMBH (DE) 2023-09-06 EP disclosed
EP-4004125-A1 MIXING SYSTEM FOR PRODUCING AQUEOUS COATING AGENTS WITH A LOW VOC BASF Coatings GmbH (DE) 2022-06-01 EP disclosed
WO-2021018594-A1 MIXING SYSTEM FOR PRODUCING AQUEOUS COATING AGENTS WITH A LOW VOC BASF COATINGS GMBH (DE) 2021-02-04 WO disclosed
US-10814605-B2 Crosslinkable or functionalizable polymers for 3D printing of soft materials UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2020-10-27 US disclosed
EP-3315535-B1 METHOD OF PRODUCTION OF CONJUGATED DIENE RUBBER ZEON CORP (JP) 2019-11-13 EP disclosed
US-20190292289-A1 METHOD FOR PRODUCING FOR CONJUGATED-DIENE-BASED RUBBER ZEON CORPORATION (JP) 2019-09-26 US disclosed
EP-3543278-A1 METHOD FOR PRODUCING CONJUGATED-DIENE-BASED RUBBER Zeon Corporation (JP) 2019-09-25 EP disclosed
CN-105658760-B Well treatment fluid and its application method comprising zirconium crosslink agent 贝克休斯公司 2019-08-20 CN disclosed
WO-2001004222-A1 AQUEOUS COATING SUBSTANCE, METHOD FOR ITS PRODUCTION AND ITS USE BASF COATINGS AG (DE) 2001-01-18 WO disclosed
WO-2001002502-A1 VARNISH AND ITS USE FOR PRODUCING VARNISH COATINGS AND COLOR-AND/OR EFFECT-PRODUCING MULTI-LAYER COATINGS BASF COATINGS AG (DE) 2001-01-11 WO disclosed
WO-2001002102-A2 COLORING AND/OR EFFECT-CREATING MULTILAYER ENAMEL COATING, METHOD FOR THE PRODUCTION THEREOF AND ITS USE BASF COATINGS AG (DE) 2001-01-11 WO disclosed
WO-2001002500-A1 COATING MATERIAL AND ITS USE FOR PRODUCING FILLER COATS AND STONE IMPACT PROTECTION PRIMERS BASF COATINGS AG (DE) 2001-01-11 WO disclosed
WO-2000039169-A1 COATING AGENT BASF COATINGS AG (DE) 2000-07-06 WO disclosed
WO-2000037507-A1 METHOD FOR PRODUCING A POLYMER REACTION PRODUCT BASF COATINGS AG (DE) 2000-06-29 WO disclosed
US-5724629-A Liquid developer monitoring device, liquid developer controlling system, and image forming apparatus using same MINOLTA CO., LTD. (JP) 1998-03-03 US disclosed
EP-0316013-A2 Silver halide photographic material having at least one dyed hydrophilic colloid layer Fuji Photo Film Co., Ltd. (JP) 1989-05-17 EP disclosed