SCHEMBL11206642

SCHEMBL11206642

CCN(CC)C(=Cc1ccccc1)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.49
L3MBTL1 Q9Y468 2/20 0.49
ALDH1A1 P00352 3/20 0.46
HPGD P15428 2/20 0.46
AKR1C1 Q04828 1/20 0.42
KDM1A O60341 1/20 0.42
MAPT P10636 3/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
MTNR1A P48039 2/20 0.41
MTNR1B P49286 2/20 0.41
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 3/20 0.40
HTT P42858 2/20 0.40
NPSR1 Q6W5P4 2/20 0.40
CYP2D6 P10635 2/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12411252 1.00 NPC1 (0.49) NPC1L3MBTL1ALDH1A1HPGDAKR1C1
SCHEMBL9804059 0.88 CYP19A1 (0.47) NPC1L3MBTL1ALDH1A1HPGDKDM1A
SCHEMBL5709306 0.88 ALDH1A1 (0.47) NPC1L3MBTL1ALDH1A1HPGDMAPT
SCHEMBL6090753 0.82 HPGD (0.45) ALDH1A1HPGDMAPTLMNACYP2D6
SCHEMBL6379933 0.82 HPGD (0.45) ALDH1A1HPGDMAPTLMNACYP2D6
SCHEMBL17955311 0.81 ALDH1A1 (0.50) NPC1L3MBTL1ALDH1A1HPGDMAPT
SCHEMBL12411256 0.81 ALDH1A1 (0.50) NPC1L3MBTL1ALDH1A1HPGDMAPT
SCHEMBL5499677 0.80 LMNA (0.47) HPGDLMNA
SCHEMBL2428644 0.80 LMNA (0.47) HPGDLMNA
SCHEMBL9446220 0.79 ALDH1A1 (0.52) L3MBTL1ALDH1A1HPGDAKR1C1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP claimed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US claimed
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP disclosed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US disclosed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP disclosed