SCHEMBL16854079

SCHEMBL16854079

COCc1cc(C(C)(C)c2ccc(C(C)(C)c3cc(C)c(O)c(COC)c3)cc2)cc(C)c1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 8/20 0.45
ESR2 Q92731 6/20 0.45
HPGD P15428 4/20 0.45
TSHR P16473 4/20 0.45
CYP3A4 P08684 3/20 0.45
HSD17B10 Q99714 2/20 0.45
AR P10275 2/20 0.45
SLC6A2 P23975 1/20 0.45
SLC6A4 P31645 1/20 0.45
HTR6 P50406 1/20 0.45
ESRRG P62508 1/20 0.45
SLC6A3 Q01959 1/20 0.45
ALOX15 P16050 3/20 0.43
KLF10 Q13118 1/20 0.43
MAPK1 P28482 1/20 0.43
HTT P42858 1/20 0.43
ALDH1A1 P00352 4/20 0.41
PRKCE Q02156 3/20 0.41
MAPT P10636 3/20 0.41
MYLK Q15746 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3356238 0.95 ALOX15 (0.47) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL248523 0.94 ESR1 (0.40) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL18100867 0.93 ALOX15 (0.50) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL18218028 0.92 ALOX15 (0.41) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL16850511 0.91 KLF10 (0.41) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL20225407 0.90 ALOX15 (0.45) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL25446810 0.89 ESR1 (0.36) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL12432082 0.87 PRKCE (0.40) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL16318035 0.87 RORC (0.38) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL13410390 0.87 PRKCE (0.40) ESR1ESR2HPGDTSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350305-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-11-02 US disclosed
US-20230298923-A1 MULTILAYER BODY, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230298923-A1 MULTILAYER BODY, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230213858-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20230143007-A1 MULTILAYER OBJECT AND RELEASE AGENT COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-11 US disclosed
US-9405188-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device SAMSUNG SDI CO., LTD. (KR) 2016-08-02 US disclosed
US-20150177617-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device SAMSUNG SDI CO., LTD. (KR) 2015-06-25 US disclosed