SCHEMBL1685753

SCHEMBL1685753

C=C(C)C(=O)OC(CO)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GSR P00390 1/20 0.46
BLM P54132 1/20 0.43
HPGD P15428 1/20 0.42
ELANE P08246 1/20 0.41
PABPC1 P11940 1/20 0.40
APOBEC3A P31941 1/20 0.40
APOBEC3G Q9HC16 1/20 0.40
ALDH1A1 P00352 1/20 0.39
CYP3A4 P08684 1/20 0.39
KMT2A Q03164 1/20 0.37
MTNR1A P48039 1/20 0.37
MTNR1B P49286 1/20 0.37
TRPA1 O75762 2/20 0.36
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
CHRM2 P08172 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1372183 0.87 HPGD (0.42) HPGDELANEPABPC1APOBEC3AAPOBEC3G
SCHEMBL27876202 0.87 HPGD (0.42) GSRHPGDELANEPABPC1APOBEC3A
SCHEMBL1130098 0.85 MTNR1A (0.45) HPGDELANEPABPC1APOBEC3AAPOBEC3G
SCHEMBL10531695 0.85 STAT3 (0.40) BLMALDH1A1
SCHEMBL4596085 0.84 ALDH1A1 (0.40) HPGDELANEPABPC1APOBEC3AAPOBEC3G
SCHEMBL2319089 0.84 HPGD (0.40) HPGDELANEPABPC1APOBEC3AAPOBEC3G
SCHEMBL57281 0.84 TSHR (0.47) HPGDELANEPABPC1APOBEC3AAPOBEC3G
SCHEMBL15088299 0.84 TSHR (0.33) GSRBLMALDH1A1
Ethylene Glycol SCHEMBL21772119 0.83 TSHR (0.44) GSRBLMHPGDELANEPABPC1
Methacrylic Acid SCHEMBL28503838 0.83 MTNR1A (0.43) HPGDELANEPABPC1APOBEC3AAPOBEC3G

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4111871-A ACRYLATE OR METHACRYLATE MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1978-09-05 US claimed
US-3993684-A PHOTOSENSITIVE ACRYLIC ESTER POLYMERS WESTERN LITHO PLATE & SUPPLY CO. (US) 1976-11-23 US claimed
CN-112638348-A Methods and compositions for stabilizing nanogels and dental compositions produced from nanogels 登士柏希罗纳有限公司 2021-04-09 CN disclosed
CN-102138218-B Resin composition, gate insulating layer and organic thin film transistor SUMITOMO CO LTD 2013-07-31 CN disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
CN-102138218-A Resin composition, gate insulating layer and organic thin film transistor SUMITOMO CHEMICAL CO 2011-07-27 CN disclosed
EP-2308081-A1 DUAL DAMASCENE VIA FILLING COMPOSITION AZ Electronic Materials USA Corp. (US) 2011-04-13 EP disclosed
WO-2010007477-A1 DUAL DAMASCENE VIA FILLING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-01-21 WO disclosed
US-20100015550-A1 DUAL DAMASCENE VIA FILLING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. 2010-01-21 US disclosed
EP-0407858-A1 Polymer composition having improved durability and method relating thereto THE B.F. GOODRICH COMPANY (US) 1991-01-16 EP disclosed
EP-0106047-B1 OLEFINICALLY UNSATURATED SILOXANES, PROCESS FOR THEIR PREPARATION AND THEIR USE AS REACTIVE DILUENTS IN RADICALLY CROSS-LINKABLE LACQUERING SYSTEMS BAYER AG (DE) 1985-10-23 EP disclosed
US-RE31985-E UNSATURATED POLYESTER, SURFACTANT AND THICKENER Dai Nippon Toryo Co, Ltd. (JP) 1985-09-17 US disclosed
EP-0106047-A1 Olefinically unsaturated siloxanes, process for their preparation and their use as reactive diluents in radically cross-linkable lacquering systems BAYER AG (DE) 1984-04-25 EP disclosed
US-4296014-A COMPRISING A POLYESTER-ACRYLIC CROSSLINKABLE GRAFT POLYMER AND A SURFACTANT OR THICKENER DAI NIPPON TORYO CO., LTD. (JP) 1981-10-20 US disclosed