Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.39 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.39 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | CTSK | P43235 | 1/20 | 0.37 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | MMP8 | P22894 | 1/20 | 0.36 |
| ▸ | MMP14 | P50281 | 1/20 | 0.36 |
| ▸ | MME | P08473 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.35 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27876202 | 0.84 | HPGD (0.42) | ALDH1A1HPGDLMNATSHRPABPC1 | |
| SCHEMBL1685753 | 0.84 | GSR (0.46) | ALDH1A1HPGDPABPC1APOBEC3AAPOBEC3G | |
| SCHEMBL1372183 | 0.84 | HPGD (0.42) | ALDH1A1HPGDLMNAPABPC1APOBEC3A | |
| SCHEMBL765398 | 0.83 | PABPC1 (0.52) | ALDH1A1LMNATSHRPABPC1APOBEC3A | |
| SCHEMBL20179578 | 0.83 | PABPC1 (0.52) | ALDH1A1LMNATSHRPABPC1APOBEC3A | |
| SCHEMBL1130098 | 0.83 | MTNR1A (0.45) | ALDH1A1HPGDTSHRPABPC1APOBEC3A | |
| SCHEMBL57281 | 0.81 | TSHR (0.47) | ALDH1A1HPGDTSHRPABPC1APOBEC3A | |
| SCHEMBL2319089 | 0.81 | HPGD (0.40) | ALDH1A1HPGDLMNAPABPC1APOBEC3A | |
| Methacrylic Acid SCHEMBL28503838 | 0.80 | MTNR1A (0.43) | HPGDTSHRPABPC1APOBEC3AAPOBEC3G | |
| SCHEMBL10531814 | 0.80 | GSR (0.46) | ALDH1A1HPGDPABPC1APOBEC3AAPOBEC3G |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101467101-A | Lithographic plate material | KONICA MINOLTA MED & GRAPHIC (JP) | 2009-06-24 | — | — | CN | disclosed |
| EP-0843218-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-6746812-B2 | USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-08 | — | — | US | disclosed |
| EP-1314552-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-28 | — | — | EP | disclosed |
| EP-0949539-B1 | Photosensitive resin composition | FUJI PHOTO FILM CO LTD (JP) | 2003-03-19 | — | — | EP | disclosed |
| EP-1225478-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020051929-A1 | Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life | FUJIFILM CORPORATION (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6110640-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |