Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.63 |
| ▸ | TSHR | P16473 | 9/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | APEX1 | P27695 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL641783 | 0.94 | THRB (0.57) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL3343927 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL8850806 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL672400 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL41274 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL8851515 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL156576 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL7154370 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL11112032 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB | |
| Propene SCHEMBL2404837 | 0.91 | THRB (0.63) | THRBTSHRALDH1A1TDP1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118909589-A | High-oxygen-permeability silicone gel composition, lens and preparation method thereof | 深圳市眼学科技有限公司 | 2024-11-08 | — | — | CN | claimed |
| CN-113527581-B | Water gel composition and water gel lens | 晶硕光学股份有限公司 | 2024-08-02 | — | — | CN | claimed |
| US-11479659-B2 | Opaque high-impact methyl methacrylate-butadiene-styrene polymer for improving impact resistance of polyvinyl chloride and preparation method thereof | SHANDONG DONGLIN NEW MATERIALS CO., LTD (CN) | 2022-10-25 | — | — | US | claimed |
| US-20210221982-A1 | OPAQUE HIGH-IMPACT METHYL METHACRYLATE-BUTADIENE-STYRENE POLYMER FOR IMPROVING IMPACT RESISTANCE OF POLYVINYL CHLORIDE AND PREPARATION METHOD THEREOF | SHANDONG DONGLIN NEW MATERIALS CO., LTD (CN) | 2021-07-22 | — | — | US | claimed |
| CN-101008781-A | Method for improving color photoresist characteristics and color photoresist | ECHEM SOLUTIONS CORP (CN) | 2007-08-01 | — | — | CN | claimed |
| CN-118909589-A | High-oxygen-permeability silicone gel composition, lens and preparation method thereof | 深圳市眼学科技有限公司 | 2024-11-08 | — | — | CN | disclosed |
| CN-113527581-B | Water gel composition and water gel lens | 晶硕光学股份有限公司 | 2024-08-02 | — | — | CN | disclosed |
| US-11479659-B2 | Opaque high-impact methyl methacrylate-butadiene-styrene polymer for improving impact resistance of polyvinyl chloride and preparation method thereof | SHANDONG DONGLIN NEW MATERIALS CO., LTD (CN) | 2022-10-25 | — | — | US | disclosed |
| CN-114671974-A | Silicon hydrogel contact lens and formula and preparation method thereof | 华诺森（武汉）生物医药技术有限公司 | 2022-06-28 | — | — | CN | disclosed |
| CN-110951002-B | High-fluidity toughening agent and application thereof in engineering plastic processing | 威海金合思化工有限公司 | 2022-04-01 | — | — | CN | disclosed |
| CN-110845671-B | Toughening agent introduced with dendritic macromolecule and preparation method and application thereof | 威海金合思化工有限公司 | 2022-02-01 | — | — | CN | disclosed |
| US-20210221982-A1 | OPAQUE HIGH-IMPACT METHYL METHACRYLATE-BUTADIENE-STYRENE POLYMER FOR IMPROVING IMPACT RESISTANCE OF POLYVINYL CHLORIDE AND PREPARATION METHOD THEREOF | SHANDONG DONGLIN NEW MATERIALS CO., LTD (CN) | 2021-07-22 | — | — | US | disclosed |
| CN-101405253-B | High refractive index monomers and (co)polymers prepared therefrom | PROCORNEA HOLDING BV | 2012-07-18 | — | — | CN | disclosed |
| US-7922908-B2 | Separation system, components of a separation system and methods of making and using them | DIONEX CORPORATION (US) | 2011-04-12 | — | — | US | disclosed |
| CN-101405253-A | High refractive index monomers and (co)polymers prepared therefrom | PROCORNEA HOLDING BV (NL) | 2009-04-08 | — | — | CN | disclosed |
| CN-101008781-A | Method for improving color photoresist characteristics and color photoresist | ECHEM SOLUTIONS CORP (CN) | 2007-08-01 | — | — | CN | disclosed |
| CN-1867869-A | Resin microparticle as raw material for toner, dispersion system thereof and toner | MITSUI CHEMICALS INC (JP) | 2006-11-22 | — | — | CN | disclosed |
| US-20060207939-A1 | Novel separating system having synergistic relationships with a polymer having separation-effective openings; polymerizable mixture is placed in a container with a porogen or solvent and polymerized to form a plug having separation-effective openings for use in separation system | DIONEX CORPORATION | 2006-09-21 | — | — | US | disclosed |
| CN-1223900-C | Photo-sensitive conducting resin, conductor pattern forming method and manufacturing method of ceramic laminated structural parts | MURATA MANUFACTURING CO (JP) | 2005-10-19 | — | — | CN | disclosed |
| CN-1403874-A | Photo-sensitive conducting resin, conductor pattern forming method and manufacturing method of ceramic laminated structural parts | MURATA MANUFACTURING CO (JP) | 2003-03-19 | — | — | CN | disclosed |