SCHEMBL16902902

SCHEMBL16902902

Oc1ccc(C2(c3ccc(OCOc4ccc(C5(c6ccc(O)cc6)c6ccccc6-c6ccccc65)cc4)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.47
▸ MEN1 O00255 3/20 0.47
▸ KMT2A Q03164 3/20 0.47
▸ MAPT P10636 2/20 0.47
▸ SMN1; SMN2 Q16637 2/20 0.47
▸ KDM4E B2RXH2 1/20 0.47
▸ OPRK1 P41145 1/20 0.47
▸ ESR1 P03372 2/20 0.44
▸ ESR2 Q92731 2/20 0.44
▸ CYP1A2 P05177 1/20 0.43
▸ PTGS1 P23219 1/20 0.43
▸ SLC6A2 P23975 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ PTGS2 P35354 1/20 0.43
▸ SLC6A3 Q01959 1/20 0.43
▸ HIF1A Q16665 1/20 0.43
▸ HDAC6 Q9UBN7 1/20 0.43
▸ PDE4D Q08499 5/20 0.41
▸ GPR55 Q9Y2T6 2/20 0.41
▸ CHRM2 P08172 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16902905 0.90 LMNA (0.47) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902903 0.89 DRD4 (0.46) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902904 0.89 NR5A1 (0.47) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL17465611 0.88 LMNA (0.62) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902910 0.88 NR5A1 (0.50) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902909 0.88 NR5A1 (0.50) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902908 0.88 NR5A1 (0.50) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902919 0.88 NR5A1 (0.50) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16902912 0.88 NR5A1 (0.50) LMNAMEN1KMT2AMAPTSMN1; SMN2
SCHEMBL12588044 0.88 LTA4H (0.53) LMNAMEN1KMT2AMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 — — US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 — — US disclosed
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