SCHEMBL17012467

SCHEMBL17012467

C=CCOC1=CC=C(C(C)(c2ccccc2)c2ccc(OCCCOc3ccc(C(C)(c4ccccc4)c4ccc(OCC=C)cc4)cc3)cc2)CC1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 8/20 0.40
▸ GAA P10253 1/20 0.40
▸ KDM4E B2RXH2 9/20 0.39
▸ SMN1; SMN2 Q16637 4/20 0.39
▸ MEN1 O00255 5/20 0.39
▸ KMT2A Q03164 5/20 0.39
▸ POLB P06746 2/20 0.36
▸ HTT P42858 1/20 0.35
▸ MAPT P10636 2/20 0.34
▸ HRH3 Q9Y5N1 2/20 0.34
▸ LTA4H P09960 1/20 0.34
▸ LMNA P02545 2/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12370725 0.86 ALDH1A1 (0.50) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL12370702 0.80 SMN1; SMN2 (0.46) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL12370726 0.75 ALDH1A1 (0.50) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL14080663 0.75 ADRA2A (0.31) MEN1KMT2AHTT
SCHEMBL827011 0.74 CA12 (0.49) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL12370736 0.74 ALDH1A1 (0.50) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL12370714 0.74 ALDH1A1 (0.53) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL14080729 0.73 ADRA2A (0.34) MEN1KMT2AHTT
SCHEMBL12370708 0.72 KDM4E (0.50) ALDH1A1GAAKDM4ESMN1; SMN2MEN1
SCHEMBL12370719 0.72 ALDH1A1 (0.51) ALDH1A1GAAKDM4ESMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765264-B1 DENTAL COMPOSITION CONTAINING UNSATURATED CARBOSILANE CONTAINING COMPONENTS MINNESOTA MINING MFG GMBH (DE) 2015-08-19 — — EP disclosed
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