SCHEMBL17017262

SCHEMBL17017262

CCCC(C)c1ccc(C(C)(O)C(F)(F)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 18/20 0.41
PDE2A O00408 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL97572 0.86 HSD11B1 (0.43) HSD11B1PDE2A
SCHEMBL23312301 0.82 RIPK1 (0.40) PDE2A
SCHEMBL2090318 0.80 PDE2A (0.49) PDE2A
SCHEMBL12026598 0.78 HSD11B1 (0.50) HSD11B1PDE2A
SCHEMBL18922612 0.76 RIPK1 (0.38)
SCHEMBL9746668 0.75 RIPK1 (0.43)
SCHEMBL10165226 0.75 HSD11B1 (0.59) HSD11B1
SCHEMBL26239341 0.75 HSD11B1 (0.40) HSD11B1
SCHEMBL18885111 0.72 KDM4E (0.42) PDE2A
SCHEMBL16591712 0.72 HSD11B1 (0.41) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507262-B2 Resist top-coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-29 US disclosed
US-20150234274-A1 RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-20 US disclosed