Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7853498 | 0.79 | TSHR (0.30) | TSHR | |
| SCHEMBL27448399 | 0.77 | — | — | |
| SCHEMBL2659212 | 0.77 | — | — | |
| SCHEMBL5705224 | 0.75 | — | — | |
| SCHEMBL5515051 | 0.75 | LMNA (0.32) | — | |
| SCHEMBL1840425 | 0.75 | — | — | |
| SCHEMBL6890508 | 0.73 | ALDH1A1 (0.35) | TSHR | |
| SCHEMBL7381942 | 0.73 | — | — | |
| SCHEMBL169333 | 0.73 | — | — | |
| SCHEMBL11402622 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 629 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1353225-B1 | Radiation sensitive composition and compound | FUJIFILM CORP (JP) | 2014-06-04 | — | — | EP | claimed |
| US-8426101-B2 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | claimed |
| EP-1406122-B1 | PHOTOSENSITIVE COMPOSITION AND ACID GENERATOR | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | claimed |
| US-8252508-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2012-08-28 | — | — | US | claimed |
| US-7867697-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2011-01-11 | — | — | US | claimed |
| US-20100261117-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-10-14 | — | — | US | claimed |
| US-7510822-B2 | Stimulation sensitive composition and compound | FUJIFILM CORPORATION (JP) | 2009-03-31 | — | — | US | claimed |
| US-7192685-B2 | Positive resist composition and method of forming resist pattern using the same. | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | claimed |
| US-7090960-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-15 | — | — | US | claimed |
| US-7074544-B2 | Image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-11 | — | — | US | claimed |
| US-20050142484-A1 | Image recording material | FUJI PHOTO FILM CO., LTD. | 2005-06-30 | — | — | US | claimed |
| US-6830867-B2 | Acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-14 | — | — | US | claimed |
| US-20030165776-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2003-09-04 | — | — | US | claimed |
| CN-118020024-A | Actinic-ray-sensitive or radiation-sensitive resin composition, and method for producing resist pattern | 富士胶片株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117693716-A | Pattern forming method and method for manufacturing electronic device | 富士胶片株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-117651910-A | Actinic-ray-or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | 富士胶片株式会社 | 2024-03-05 | — | — | CN | disclosed |
| US-20030170562-A1 | A polymer having a silicon atom in a side chain, which is insoluble in aqueous alkali solution and becomes soluble in aqueous alkali solution by the action of an acid, generated by acid generator on exposure to active light radiation | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| US-20030165776-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2003-09-04 | — | — | US | disclosed |
| US-20030148206-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-08-07 | — | — | US | disclosed |
| EP-1300727-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |